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Rheed Monitoring of Rotating Samples During Largearea Homogeneous Deposition of Oxides

Published online by Cambridge University Press:  10 February 2011

V. C. Matijasevic ,
Z. Lu ,
K. Von Dessonneck ,
C. Taylor  and
D. Barlett
V. C. Matijasevic
Affiliation:
Conductus, Inc., 969 West Maude Ave., Sunnyvale, CA 94086, vlad@conductus.com
Z. Lu
Affiliation:
Conductus, Inc., 969 West Maude Ave., Sunnyvale, CA 94086, vlad@conductus.com
K. Von Dessonneck
Affiliation:
Conductus, Inc., 969 West Maude Ave., Sunnyvale, CA 94086, vlad@conductus.com
C. Taylor
Affiliation:
k-Space Associates, Inc., 555 S. Forest Avenue, Ann Arbor, MI 48104
D. Barlett
Affiliation:
k-Space Associates, Inc., 555 S. Forest Avenue, Ann Arbor, MI 48104
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Abstract

We have successfully implemented RHEED monitoring of growth of complex oxides in a reactive evaporation process with substrate rotation and an oxygen environment. A rotating substrate heater is used with a partial enclosure kept at a 10 mTorr oxygen pressure. This heater allows for simultaneous and uniform deposition of multiple 2-inch wafers. The RHEED beam diffracts from samples as they pass through the high-vacuum zone of the heater. A CCD camera is used for RHEED data acquisition and image capture is synchronized to sample position. In order to achieve good quality diffracted images, rotation of the sample is required to be less than 1 degree for the duration of data capture. With our relatively inexpensive setup images can be acquired for sample rotation speeds up to 1500 RPM. We use this RHEED diagnostic system for study of in-situ growth of high-temperature superconducting thin films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 502: Symposium II – In Situ Process Diagnostics & Intelligent Materials Processing , 1997 , 249
Copyright
Copyright © Materials Research Society 1998

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References

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