Hostname: page-component-848d4c4894-v5vhk Total loading time: 0 Render date: 2024-06-17T18:31:49.973Z Has data issue: false hasContentIssue false
  • English
  • Français

Refractive Index Profiles of High Dose Ti Implanted Optical Waveguides in LiNbO3

Published online by Cambridge University Press:  25 February 2011

T. Bremer ,
P.R. Ashley ,
R. Irmscher  and
Ch. Buchal
T. Bremer
Affiliation:
University of Osnabrück, D-4500 Osnabrück, FRG
P.R. Ashley
Affiliation:
Research Directorate, USAML Redstone Arsenal, AL 35898
R. Irmscher
Affiliation:
Inst. Schicht- und Ionentechnik, KFA, D-5170 Jülich, FRG
Ch. Buchal
Affiliation:
Inst. Schicht- und Ionentechnik, KFA, D-5170 Jülich, FRG
Get access

Abstract

Single crystalline substrates of LiNb03 have been implanted with 48Ti ions at 200 keV and doses up to 4 × 1017 cm−2. The implants have been performed at wafer temperatures of 77 K, 300 K and 620 K. Immediate subsequent processing at 1273 K in wet oxygen ambient led to good epitaxial regrowth at all doses, if sufficient time was allowed. The maximum observed extraordinary refractive index change after regrowth Δne=0.04, indicating a solubility limit of 3.3×l021 Ti cm−3 corresponding to 18 % of Nb5+ replaced by Ti4+.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 157: Symposium A – Beam-Solid Interactions: Physical Phenomena , 1989 , 525
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Korotky, S.K. in Integrated Optical Circuits, edt. Hutcheson, L.D. (Marcel Dekker, New York, 1987)Google Scholar
2 Electro-optic and Photorefractive Materials, Springer Proc. Phys. .18, ed. P. Gunter, 179 (Berlin 1987)Google Scholar
3 Ashley, P.R., Chang, W.S.C., Bûchai, Ch. and Thomas, D.K., IEEE J. Lightw. Technol. 7, 855 (1989)Google Scholar
4 Bûchai, Ch., Ashley, P.R. and Appleton, B.R., J. Mater. Res. 2, 222 (1987)Google Scholar
5 Bûchai, Ch., Irmscher, R. and Gunter, P., Mat. Res. Soc. Symp. Proc. 128, 719 (1989)Google Scholar
6 Ziegler, J.F., Biersack, J.P. and Littmark, U., Stopping and Ranges of Ions in Matter (Pergamon Press, N.Y., 1985)Google Scholar
7 Hertel, P. and Menzler, H.P., Appl. Phys. B44, 75 (1987)Google Scholar
8 Bremer, T., Heiland, W., Bûchai, Ch., Irmscher, R. and Stritzker, B., J. Appl. Phys., in press (1989/1990)Google Scholar
9 Vollmer, J., Nisius, J.P., Hertel, P. and Krâtzig, E., Appl. Phys. A32, 125 (1983)Google Scholar