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The Reaction of NH3 With TiN: Implications for CVD

Published online by Cambridge University Press:  10 February 2011

Michelle T. Schulberg ,
Mark D. Allendorf  and
Duane A. Outka
Michelle T. Schulberg
Affiliation:
Sandia National Laboratories, Livermore, CA 94551-0969
Mark D. Allendorf
Affiliation:
Sandia National Laboratories, Livermore, CA 94551-0969
Duane A. Outka
Affiliation:
Sandia National Laboratories, Livermore, CA 94551-0969
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Abstract

Since NH3 is an important component of TiN chemical vapor deposition (CVD) processes, understanding the NH3/TiN surface interaction is crucial to developing a model for the overall reaction. Temperature programmed desorption experiments show that NH3 adsorbs molecularly on amorphous TiN surfaces. Chemisorption occurs at only ∼5% of the surface sites, with an activation energy for desorption of 24 kcal/mol. The sticking probability into this state is 0.06 at 100 K. In addition, NH3 adsorbs with high probability into a multilayer state with an activation energy for desorption of 7.3 kcal/mol, similar to that found in other systems. NH3 does not dissociate on TiN. Under CVD conditions, however, the reactivity of NH3 on TiN may increase and surface reactions may play a part in film growth.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 410: Symposium S – Covalent Ceramics III-Science and Technology of Non-Oxides , 1995 , 453
Copyright
Copyright © Materials Research Society 1996

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References

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