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Rapid Thermal Crystallization Of LPCVD Amorphous Silicon Films

Published online by Cambridge University Press:  15 February 2011

A. T. Voutsas ,
M. K. Hatalis ,
K. R. Olasupo ,
A. K. Nanda  and
D. Alugbin
A. T. Voutsas
Affiliation:
Lehigh University, Display Research Laboratory, Bethlehem, PA. 18015
M. K. Hatalis
Affiliation:
Lehigh University, Display Research Laboratory, Bethlehem, PA. 18015
K. R. Olasupo
Affiliation:
AT&T Bell Laboratories, Allentown, PA. 18103
A. K. Nanda
Affiliation:
AT&T Bell Laboratories, Allentown, PA. 18103
D. Alugbin
Affiliation:
AT&T Bell Laboratories, Allentown, PA. 18103
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Abstract

The crystallization of LPCVD a-Si by Rapid Thermal Anneal was investigated. RTA polysilicon films can find application in the fabrication of TFTs for AMLCDs, due to the lower thermal budget associated with fast crystallization at high temperatures. It was found that the grain size of the crystallized films decreases with the temperature, in the range of 700°C to 1100°C, while for higher temperatures the opposite trend is observed. The latter observation was attributed to the high thermal vibration of subcritical clusters, that was assumed responsible for the decline in the nuclei population at high annealing temperatures, combined with the faster crystalline growth rate at high temperatures. RTA silicon films were found to have lower intra-grain defect density, that may result in the improvement of the electrical characteristics of the polysilicon films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 345: Symposium M – Flat Panel Display Materials , 1994 , 93
Copyright
Copyright © Materials Research Society 1994

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