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Radiative Recombination Processes in Boron Modulation-Doped SiGe Quantum Wells

Published online by Cambridge University Press:  26 February 2011

I. A. Buyanova
Affiliation:
On leave from the Institute of Semiconductor Physics, Ukrainian Academy of Sciences, Kiev, Ukraine
W. M. Chen
Affiliation:
Department of Physics and Measurement Technology, Linkbping University, S-581 83 Linköping, Sweden
A. Henry
Affiliation:
Department of Physics and Measurement Technology, Linkbping University, S-581 83 Linköping, Sweden
W. X. Ni
Affiliation:
Department of Physics and Measurement Technology, Linkbping University, S-581 83 Linköping, Sweden
G. V. Hansson
Affiliation:
Department of Physics and Measurement Technology, Linkbping University, S-581 83 Linköping, Sweden
B. Monemar
Affiliation:
Department of Physics and Measurement Technology, Linkbping University, S-581 83 Linköping, Sweden
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Abstract

The radiative recombination processes of the two-dimensional hole gas formed in SiGe quantum wells (QWs) due to modulation doping are studied in details by photoluminescence (PL) spectroscopy. Boron-modulation-doped Si/Sil−xGex/Si heterostructures grown by molecular beam epitaxy (MBE) are studied. It is shown that charge transfer of holes from the doped Si layers causes the filling of the SiGe QWs leading to an appearance of a broad asymmetric PL band with a characteristic sharp high energy cut-off and enhanced recombination near the Fermi edge. A reduction of this PL enhancement is observed with an increase of measuring temperature. The PL bandwidth and the high energy cut-off are found to vary with either the doping level or the spatial separation between the delta-doped layers and the QWs. This PL band is argued to arise from the recombination of the holes in the QWs and electrons confined near the QWs as a result of the band bending induced by the delta-doping. The shape of the PL band with enhanced intensity near the Fermi edge are discussed in terms of the phase space filling and many-body effects.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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