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Pulsed Laser Deposition of Nd-Doped YBa2Cu3O7-x Films for Coated Conductor Applications

Published online by Cambridge University Press:  15 February 2011

C. Varanasi
Affiliation:
Air Force Research Laboratory, Wright-Patterson AFB, OH
R.R. Biggers
Affiliation:
Air Force Research Laboratory, Wright-Patterson AFB, OH
I. Maartense
Affiliation:
Air Force Research Laboratory, Wright-Patterson AFB, OH
D. Dempsey
Affiliation:
Air Force Research Laboratory, Wright-Patterson AFB, OH
T.L. Peterson
Affiliation:
Air Force Research Laboratory, Wright-Patterson AFB, OH
J. Solomon
Affiliation:
Air Force Research Laboratory, Wright-Patterson AFB, OH
J. Mcdaniel
Affiliation:
Air Force Research Laboratory, Wright-Patterson AFB, OH
G. Kozlowski
Affiliation:
Air Force Research Laboratory, Wright-Patterson AFB, OH
R. Nekkanti
Affiliation:
Air Force Research Laboratory, Wright-Patterson AFB, OH
C.E. Oberly
Affiliation:
Air Force Research Laboratory, Wright-Patterson AFB, OH
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Abstract

Pulsed-laser ablation was used to deposit YBa2Cu3O7-x (YBCO) films on LaAlO3 and metallic substrates in an effort to understand and develop the processing of coated conductors with enhanced properties. Doping of YBCO films with Nd was utilized as an approach for increasing their flux pinning properties. Separate targets of Nd2O3 and YBCO were used instead of a pre-mixed Nd2O3-YBCO target. The critical current density (Jc) of the films was measured by whole body dc transport measurements and the transition temperature (Tc) by ac susceptibility. The composition vs. depth profiles of the films were obtained by Secondary Ion Mass Spectrometry. The critical current of a 5000 Å thick Nd-doped YBCO film on a LaAlO3 substrate was measured at 77 K and found to be 57 A (Jc = 1.1×106 A/cm2).

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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