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Properties of Tetrahedral Amorphous Carbon Deposited by A Filtered Cathodic Vacuum ARC

Published online by Cambridge University Press:  15 February 2011

M Chhowalla ,
C W Chen ,
B Kleinsorge ,
J Robertson ,
G A J Amaratunga  and
W I Milne
M Chhowalla
Affiliation:
Dept of Engineering, Cambridge University, Cambridge C02 1PZ, UK.
C W Chen
Affiliation:
Dept of Engineering, Cambridge University, Cambridge C02 1PZ, UK.
B Kleinsorge
Affiliation:
Dept of Engineering, Cambridge University, Cambridge C02 1PZ, UK.
J Robertson
Affiliation:
Dept of Engineering, Cambridge University, Cambridge C02 1PZ, UK.
G A J Amaratunga
Affiliation:
Dept of Engineering, Cambridge University, Cambridge C02 1PZ, UK.
W I Milne
Affiliation:
Dept of Engineering, Cambridge University, Cambridge C02 1PZ, UK.
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Abstract

The properties of a highly sp3 bonded form of amorphous carbon denoted ta-C deposited from a filtered cathodic vacuum arc (FCVA) are described as a function of ion energy and deposition temperature. The sp3 fraction depends strongly on ion energy and reaches 85% at an ion energy of 100 eV. Other properties such as density and band gap vary in a similar fashion, with the optical gap reaching a maximum of 2.3 eV. These films are very smooth with area roughness of order 1 nm. The sp3 fraction falls suddenly to almost zero for deposition above about 200°C.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 423: Symposium E – III-Nitride, SiC, and Diamond Materials for Electronic , 1996 , 299
Copyright
Copyright © Materials Research Society 1996

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