Hostname: page-component-848d4c4894-tn8tq Total loading time: 0 Render date: 2024-07-03T22:54:25.065Z Has data issue: false hasContentIssue false
  • English
  • Français

Properties and Stability of Bismuth Doped Tin Oxide Thin Films Deposited on Various Types of Glass Substrates

Published online by Cambridge University Press:  10 February 2011

V. Foglietti ,
A. D′ Alessandro ,
A. Galbato ,
A. Alessandri ,
R. Beccherelli ,
F. Campoli ,
S. Petrocco ,
M. Wnek  and
P. Maltese
V. Foglietti
Affiliation:
Istituto di Elettronica dello Stato Solido del CNRVia Cineto Romano 42, 00156 Roma
A. D′ Alessandro
Affiliation:
Universita' degli studi di Roma “La Sapienza”, Dip. Ingegneria Elettronica, Via Eudossiana 18, 00185 Roma
A. Galbato
Affiliation:
Universita' degli studi di Roma “La Sapienza”, Dip. Ingegneria Elettronica, Via Eudossiana 18, 00185 Roma
A. Alessandri
Affiliation:
Universita' degli studi di Roma “La Sapienza”, Dip. Ingegneria Elettronica, Via Eudossiana 18, 00185 Roma
R. Beccherelli
Affiliation:
Universita' degli studi di Roma “La Sapienza”, Dip. Ingegneria Elettronica, Via Eudossiana 18, 00185 Roma
F. Campoli
Affiliation:
Universita' degli studi di Roma “La Sapienza”, Dip. Ingegneria Elettronica, Via Eudossiana 18, 00185 Roma
S. Petrocco
Affiliation:
Istituto di Elettronica dello Stato Solido del CNRVia Cineto Romano 42, 00156 Roma
M. Wnek
Affiliation:
Institute of Physics, Jagellonian University, ul. Reymonta 4, 30-059 Kracow, Poland
P. Maltese
Affiliation:
Universita' degli studi di Roma “La Sapienza”, Dip. Ingegneria Elettronica, Via Eudossiana 18, 00185 Roma
Get access

Abstract

This work reports on deposition of transparent semi-insulating tin oxide thin films deposited by spray-pyrolysis over large area glass substrates. The precursors used are based on diluted chloride solutions. Bi-doped high resistivity tin oxide thin films are required in the fabrication process of an analog grey scale ferroelectric liquid crystal matrix display. Various parameters have been optimized in order to achieve good reproducibility and uniformity of the electrical and optical properties. Deposition temperature and the properties of the glass substrates have been found as the most critical variables which affect the deposition rate and the quality of the deposited films. The different substrates used, borosilicates and soda-lime glasses, lead to different electrical properties. A further investigation on the stability of the film properties versus different kind of aging procedures have been conducted. Preliminary results of the operation of the complete display making use of our films are shown.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 424: Symposium H – Flat Panel Display Materials II , 1996 , 355
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Maltese, P., Campoli, F., Alessandro, A.D', Foglietti, V., Galbato, A., Galloppa, A., Rafaelli, G. and Wnek, M., FLC 95 Proceedings of the International Ferroelectric Liquid Crystal Conference, Cambridge 1995, Ferroelectrics, in press.Google Scholar
[2] Manifacier, J.C., Szepessy, L., Bresse, J.F. and Perotin, M., Mater. Res. Bull. 14, 163 (1979).Google Scholar
[3] Grosse, P., Schmitte, F.J., Frank, G. and Kostlin, H., Thin Solid Films 90, 309 (1988).Google Scholar
[4] Foglietti, V., Galbato, A., Bearzotti, A., Galloppa, A. and Maltese, P., in Polycrystalline thin films Mater. Res. Soc. Proc., MRS (1995), in press.Google Scholar
[5] Acutis, A. De, Rossi, M.C., Barbetti, M., in Flat Panel Display Materials, Mater. Res. Soc. Proc., MRS Vol.345, 235 (1994).Google Scholar
[6] Lifshitz, I.M. and Slezov, V.V., J. Phys. Chem. Solids, 19, 35 (1961).Google Scholar
[7] The data are taken from TAPP, thermochemical and physical properties, ES microware.Google Scholar
[8] Kojima, M., Kato, H., Imai, A. and Yoshida, A., J. Appl. Phys., 64, 1902 (1988).Google Scholar
[9] Moseley, P.T., Williams, D.E., in Techniques and mechanism in gas sensing, edited by Moseley, P.T., Norris, J.O.W. and Williams, D.E., Adam Hilger(1991)ISBN 0-7503-0074-4.Google Scholar