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Processing of Pure Ni Mocvd Films

Published online by Cambridge University Press:  10 February 2011

Laurent Brissonneau ,
Alex Reynes  and
Constantin Vahlas
Laurent Brissonneau
Affiliation:
Laboratoire Matériaux et Interfaces INPT-CNRS, ENS Chimie de Toulouse 118 Route de Narbonne, 31077 Toulouse cedex 4, France, cvahlas@ensct.fr
Alex Reynes
Affiliation:
Laboratoire Matériaux et Interfaces INPT-CNRS, ENS Chimie de Toulouse 118 Route de Narbonne, 31077 Toulouse cedex 4, France, cvahlas@ensct.fr
Constantin Vahlas
Affiliation:
Laboratoire Matériaux et Interfaces INPT-CNRS, ENS Chimie de Toulouse 118 Route de Narbonne, 31077 Toulouse cedex 4, France, cvahlas@ensct.fr
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Abstract

In this study are reported results on the processing of nickel thin films by metal-organic chemical vapor deposition starting from nickelocene, at atmospheric and reduced pressures, and at temperatures varying between 150 °C and 300 °C. Films present a Volmer-Weber type nodular morphology. Nodules are composed of small crystallites, the mean size of which is about 50 nm. Carbon (up to 10 at. % depending on processing conditions) is incorporated at interstitial rather than intergranular position in the films. High operating pressure favors carbonfree films. An analysis of the gas phase reaction by mass spectrometry is presented in order to understand the mechanisms of the carbon contamination of the deposits.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 514: Symposium I – Advanced Interconnects & Contact Materials & Processes for… , 1998 , 491
Copyright
Copyright © Materials Research Society 1998

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References

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