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Preparation of TiFe thin Films by Pulsed Ion Beam Evaporation

Published online by Cambridge University Press:  17 March 2011

Hisayuki Suematsu ,
Tsuyoshi Saikusa ,
Tsuneo Suzuki ,
Weihua Jiang  and
Kiyoshi Yatsui
Hisayuki Suematsu
Affiliation:
Extreme Energy-Density Research Institute, Nagaoka University of Technology, Nagaoka 940-2188, Japan
Tsuyoshi Saikusa
Affiliation:
Extreme Energy-Density Research Institute, Nagaoka University of Technology, Nagaoka 940-2188, Japan
Tsuneo Suzuki
Affiliation:
Extreme Energy-Density Research Institute, Nagaoka University of Technology, Nagaoka 940-2188, Japan
Weihua Jiang
Affiliation:
Extreme Energy-Density Research Institute, Nagaoka University of Technology, Nagaoka 940-2188, Japan
Kiyoshi Yatsui
Affiliation:
Extreme Energy-Density Research Institute, Nagaoka University of Technology, Nagaoka 940-2188, Japan
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Abstract

Thin films of titanium iron (TiFe) were prepared by a pulsed ion-beam evaporation (IBE) method. A pulsed ion beam of proton accelerated at 1 MV (peak) with a pulse width of 50 ns and a current of 70 kA was focused on TiFe alloy targets. Soda lime glass substrates were placed in front of the targets. Phases in the thin films were identified by X-ray diffraction (XRD). XRD results revealed that the thin films deposited on the glass substrates consist of a TiFe phase. Crystallized Ti-Fe thin films without oxides were successfully obtained. Surface roughness of the thin film was 0.16 m m.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 697: Symposium P – Surface Engineering 2001--Fundamentals and Applications , January 2001 , P5.17
Copyright
Copyright © Materials Research Society 2002

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