Hostname: page-component-848d4c4894-hfldf Total loading time: 0 Render date: 2024-05-10T23:02:38.814Z Has data issue: false hasContentIssue false

Preparation and Properties of ferroelectric Bi2SrTa2O9 thin films for FeRAM using Flash-MOCVD

Published online by Cambridge University Press:  10 February 2011

T. Ami
Affiliation:
Magnetic & Inorganic Materials Res. Gp.
K. Hironaka
Affiliation:
Magnetic & Inorganic Materials Res. Gp.
C. Isobel
Affiliation:
Yagi-microdevices Lab., Materials Research Division, SONY Research Center
N. Nagel
Affiliation:
Yagi-microdevices Lab., Materials Research Division, SONY Research Center
M. Sugiyama
Affiliation:
Yagi-microdevices Lab., Materials Research Division, SONY Research Center
Y. Ikeda
Affiliation:
Center for Materials Analysis, SONY Research Center
K. Watanabe
Affiliation:
Magnetic & Inorganic Materials Res. Gp.
A. Machida
Affiliation:
Magnetic & Inorganic Materials Res. Gp.
K. Miura
Affiliation:
Magnetic & Inorganic Materials Res. Gp.
M. Tanaka
Affiliation:
Magnetic & Inorganic Materials Res. Gp.
Get access

Abstract

Ferroelectric Bi2 SrTa2 O9 thin films were successfully prepared by liquid delivery MOCVD, and structural and electrical properties were investigated. As-deposited films showed sharp distinct peaks, which were indexed assuming a fluorite-type structure. These precursors were transformed to bismuth-layered structures by annealing at 800 °C in flowing oxygen. Reasonable ferroelectric properties were observed in a film with 170 nm-thickness. Remanent polarization and coercive field were estimated to be 5.2 μC/cm2 and 52 kV/cm, respectively, at 5V.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Scott, J.F. and Araujo, C.A. Paz de, Science 246, 1400 (1989).Google Scholar
2. Araujo, C.A. Paz de, Cuchiaro, J.D., Scott, M.C. and McMillan, L.D., International Patent Publication No.WO 93112542 (24 June 1993).Google Scholar
3. Amanuma, K., Hase, T. and Miyasaka, Y., Appl. Phys. Lett. 66 (2), 221 (1995)Google Scholar
4. Mihara, T., Yoshimori, H., Watanabe, H. and Araujo, C.A. Pas de, Jpn. J. Appl. Phys. 34,5233 (1995)Google Scholar
5. Watanabe, H., Mihara, T., Yoshimori, H. and Araujo, C.A. Pas de, Jpn. J. Appl. Phys. 34,5240 (1995)Google Scholar
6. Atsuki, T., Soyama, N., Yonezawa, T. and Ogi, K., Jpn. J. Appl. Phys. 34,5096 (1995)Google Scholar
7. Gardincr, R.A., Buskrik, P.C. Van and Kirlin, P.S., Mat. Res. Soc. Symp. Proc. 335,221 (1994).Google Scholar