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Preparation and Characterization of PbTiO3 and PbZrO3 Films from Oxide Multilayers

Published online by Cambridge University Press:  25 February 2011

Chen C. Li
Affiliation:
Department of Materials Science and Engineering, Virginia Polytechnic Institute and State University, Blacksburg, VA 24061
Seshu B. Desu
Affiliation:
Department of Materials Science and Engineering, Virginia Polytechnic Institute and State University, Blacksburg, VA 24061
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Abstract

PbTiO3 and PbZrO3 thin films were successfully fabricated from oxide multilayers by employing ion-assisted deposition process (IAD). Excellent control of the film thickness and composition were achieved by using the multilayer deposition technique. A (001)-oriented phase was found in the PbTiO3 films at 550°C with 300 and 600eV Ar+ ion bombardment. Very fine equiaxial grain size of 0.2μm was seen in the IAD deposited PbTiO3 films, which is independent of the Ar+ ion beam energy. The optical properties of the PbTiO3 films were studied for different energies of Ar+ ion beam and for various post-deposition annealing temperatures. PbTiO3 films with packing density of near unity (≅0.99) were obtained at temperatures as low as 600°C.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

1. Gavrilyachenko, V.G., Spinko, R.I., Martynenko, M.A., and Fesenko, E.G., Soviet Phys. Solid State, 12[5], 1203 (1970).Google Scholar
2. Okuyama, M., Matsui, Y., Hakano, H., Nakagawa, T., and Hamakawa, Y., Jpn. J. Appl. Phys., 18[8], 1633 (1979).Google Scholar
3. Crawford, J.C. and English, F.L., IEEE Trans. Electron. Devices, ED–16, 525 (1969).Google Scholar
4. Berry, R.W., Hall, P.M., and Harris, M.T., Thin Film Technology, (Van Nostrand Reinhold, 1968), p.113.Google Scholar
5. McNeil, J.R., McNally, J.J., and Reader, P.D., in Handbook of Thin-Film Deposition Processes and Techniques, edited by Schuegraf, K.K., (Noyes Publication, New Jersey, 1988), p. 364.Google Scholar
6. Hayashi, S., Iijima, K., and Hirao, T., Jpn. J. Appl. Phys., 30[9B], 2186 (1991).Google Scholar
7. Li, C.C. and Desu, S.B., Trans. Am. Ceram. Soc., Cincinnati, OH, 1991, in press.Google Scholar
8. Kaufman, H.R., J. Vac. Sci. Technol., 15[2], 272 (1978).Google Scholar
9. Harrop, P.J. and Wankiyn, J.N., Brit. J. Appl. Phys., 18, 739 (1967).Google Scholar
10. Aspnes, E., Thin Solid Films, 89, 249 (1982).Google Scholar