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Preparation and Characterization of Chromium Containing amorphous Hydrogenated Carbon Films (A-C:H/Cr)

Published online by Cambridge University Press:  21 February 2011

R. Gampp ,
P. Gantenbein  and
P. Oelhafen
R. Gampp
Affiliation:
University of Basel, institute of Physics, Klingelbergstrasse 82, CH-4056 Basel, Switzerland
P. Gantenbein
Affiliation:
University of Basel, institute of Physics, Klingelbergstrasse 82, CH-4056 Basel, Switzerland
P. Oelhafen
Affiliation:
University of Basel, institute of Physics, Klingelbergstrasse 82, CH-4056 Basel, Switzerland
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Abstract

Chromium containing amorphous hydrogenated carbon films (a-C:H/Cr) were prepared in a process that combines rf plasma activated chemical vapor deposition of methane and magnetron sputtering of a chromium target. During the deposition the silicon substrates were kept at 200°C and dc biased at -200 V in order to obtain films with high chemical stability which is required for the application as solar selective surfaces. the films with different Cr concentrations (5 to 49 at.%) were characterized by in situ x-ray photoelectron spectroscopy (XPS). Up to 40 at.%, chromium proves to be built into the cermet-like films in the form of chromium carbide clusters. above 40 at.%, chromium is partly metallic. a modification of the a-C:H matrix in the vicinity of the chromium carbide clusters has been observed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 388: Symposium Q – Film Synthesis and Growth Using Energetic Beams , 1995 , 305
Copyright
Copyright © Materials Research Society 1995

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