Hostname: page-component-84b7d79bbc-g5fl4 Total loading time: 0 Render date: 2024-07-26T11:29:48.743Z Has data issue: false hasContentIssue false
  • English
  • Français

Precipitation of Kr In Ni at Room Temperature

Published online by Cambridge University Press:  28 February 2011

R. C. Birtcher  and
A. S. Liu
R. C. Birtcher
Affiliation:
Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439
A. S. Liu
Affiliation:
Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439
Get access

Abstract

The fluence dependence of Kr precipitation in Ni at room temperature has been studied with the aid of Transmission Electron Microscopy. As in other metals, the Kr precipitates in small cavities. Electron diffraction demonstrates that the Kr precipitates are solid, fcc crystals aligned with each other and the Ni lattice. The trends are similar to those observed for Kr precipitation in Al at room temperature. The average Kr lattice parameter, determined from the electron diffraction, increases with increasing Kr fluence from 0.515 nm to an asymptotic value of 0.545 nm. The asymptotic limit is due to the melting of the larger Kr precipitates. The mismatch between the Kr and Ni lattices is as large as 55%. Diffuse electron scattering was observed from large, liquid Kr precipitaes. This occurs for Kr fluences above 5.1020 Kr+ m-2 in Ni and above 2.5.1020 Kr+ m-2 in Al. At room temperature, the largest solid Kr precipitate observed in dark field images was 8.3 nm in diameter compared to 4.7 nm in Al. The larger precipitates are liquid or gas. The solid Kr metals at the same lattice parameter in both Ni and Al suggesting that the melting is thermodynamic in nature and independent of the host material.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 74: Symposium A – Beam-Solid Interactions and Transient Processes , 1986 , 345
Copyright
Copyright © Materials Research Society 1987

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. vomFelde, A., Fink, J., Müller-Heinzerling, Th., Pflüger, J., Scheerer, B. and Linker, G., Phys. Rev. Lett. 53, 922 (1984).Google Scholar
2. Evans, J. H. and Mazey, D. J., J. Phys. F: Met. Phys. 15, L1 (1985).Google Scholar
3. Birtcher, R. C. and Jager, W., Ultramicroscopy, 21 (to be published).Google Scholar
4. Biersack, J. and Haggmark, L. G., Nucl. Instr. and Meth. 174, 257 (1980).Google Scholar
5. Andersen, H. H. and Bay, H. L., in Sputtering by Particle Bombardment Behrisch, I. R., ed., Topic Appl. Phys., Vol. 47 (Springer, Berlin 1981), p. 145.Google Scholar
6. Mazey, D. J. and Nelson, R. S., J. Nucl. Mater. 85 & 86, 671 (1979).Google Scholar
7. Westmacott, K. H., Smallman, R. E. and Dobson, P. S., Metal. Sci. J. 2, 177 (1968).Google Scholar
8. Lahr, P. H. and Eversole, W. G., J. Chem. Eng. data 7, 42 (1962).Google Scholar