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Plasma-Enhanced Metalorganic Chemical Vapor deposition of Lipon Thin Films

Published online by Cambridge University Press:  04 April 2011

Lamartine Meda
Lamartine Meda*
Affiliation:
Department of Chemistry, Xavier University of LA, 1 Drexel Drive, New Orleans, LA 70125, U.S.A.
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Abstract

Lithium phosphorus oxynitride (Lipon) thin films have been deposited by a plasmaenhanced metalorganic chemical vapor deposition (PE-MOCVD) method using triethyl phosphate [(CH2CH3)3PO4] and lithium tert-butoxide [(LiOC(CH3)3] precursors. Growth rates were between 100 and 415 Å/min, and thicknesses ranged from 1 to 2.5 μm. X-ray powder diffraction showed that the films were amorphous, and X-ray photoelectron spectroscopy revealed approximately 6.9 at.% carbon in the films. The ionic conductivity of Lipon was measured using electrochemical impedance spectroscopy (EIS) and approximately 1.02 μS/cm was obtained, which is consistent with the ionic conductivity of Lipon deposited by radio frequency magnetron sputtering of Li3PO4 targets. An all-solid-state thin-film lithium microbattery such as Li/Lipon/LiCoO2/Au/substrate was successfully fabricated with Lipon deposited by PE-MOCVD. The battery has a capacity of ca. 22 μAh/cm2μm.

Keywords

thin filmplasma-enhanced CVD (PECVD) (deposition)Li
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1313: Symposium KK – Materials for Advanced Lithium Batteries , 2011 , mrsf10-1313-kk09-08
Copyright
Copyright © Materials Research Society 2011

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References

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