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Plasma and DLC Film Characteristics from Pulsed Laser Ablation Of Single Crystal Graphite and Amorphous Carbon: A Comparative Study Employing Electrostatic Probe Measurements

Published online by Cambridge University Press:  10 February 2011

R. M. Mayo ,
J. W. Newman ,
A. Sharma ,
Y. Yamagata  and
J. Narayan
R. M. Mayo
Affiliation:
Department of Nuclear Engineering, North Carolina State University, Raleigh, NC 27695-7909
J. W. Newman
Affiliation:
Department of Nuclear Engineering, North Carolina State University, Raleigh, NC 27695-7909
A. Sharma
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-7907
Y. Yamagata
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-7907 Department of Electrical and Computer Engineering, Kumamoto University, Kumamoto 860-8555, Japan
J. Narayan
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-7907
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Abstract

In an ongoing effort to investigate plasma plume features yielding high quality DLC films, we have applied plasma plume diagnosis and film characterization to examine plume character distinction from KrF laser ablation of both amorphous carbon (a-C) and single crystal graphite (SCG) targets- The advancing plasma plume produced by these structurally different targets are observed to possess quantitatively similar total heavy particle inventory, ionized fraction, and electron thermal content, yet quite different ion kinetic energy, plume profile, C2 formation mechanism, and concentration of complex molecules. All data support the conclusion that the SCG target plasma plume is populated with heavier, more complex molecules than those in a-C which have been shown to be predominantly comprised of C and C+ under vacuum conditions with the addition of C2 at high fill pressure. Significantly smaller plume profile peaking factor, less energetic and slightly lower temperature plume conditions, laser energy (E1) dependent plume peaking, harder films produced at lower El strongly heterogeneous films, and lesser plume energy attenuation in high pressure background fill in SCG target plumes all support the conclusion of more massive plume species in SCG target plumes. Energy balance estimates indicate that ion kinetic energy dominates and that SCG target ablation liberates about twice the number of 12C atoms per unit El.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 617: Symposium J – Laser-Solid Interactionsfor Materials Processing , 2000 , J3.1
Copyright
Copyright © Materials Research Society 2000

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References

[1] Narayan, J. et al. , Appl. Phys. Lett. 51. 1845 (1987).Google Scholar
[2] Krishnanswamy, J. et al. , Appl. Phys. Lett. 54, 245 (1989).Google Scholar
[3] Zheng, J.P. et al. , Appl. Phys. Lctt. 54, 280 (1989).Google Scholar
[4] Singh, R. K. and Narayan, J., Phys. Rev. B 41. 8843 (1990).Google Scholar
[5] Lowndes, D. H. et al. , Science 273, 898 (1996).Google Scholar
[6] Mayo, R. M. et al. , J. Appl. Phys. 86, 2865 (1999).Google Scholar
[7] Yamagata, Y. et al. , J. Appl. Phsys. 86, 4154 (1999).Google Scholar
[8] Murray, P. T. and Peeler, D. T., J. Elec. Mater. 23, 855 (1994).Google Scholar
[9] Geohegan, D. B., in Pulsed Laser Deposition of Thin Films, edited by Chrisey, D. B. and Hubler, C. K. (John Wiley and Sons, Inc., New York, 1994), chapter 5, p. 115.Google Scholar
[10] Merkulov, V. I. et al. , Appl. Phys. Lett. 73, 2591 (1998).Google Scholar
[11] Prasad, P. S. R. et al. , Phys. Star. Sol. A 139, Kl (1993).Google Scholar
[12] Koinuma, H. et al. , Fullerene Sci. Technol. 4, 599 (1996).Google Scholar
[13] Laska, L. et al. , Carbon 34. 363 (1996).Google Scholar
[14] Zhang, Y. et al. , Appl. Phys. Lett. 73, 3827 (1998).Google Scholar
[15] Singh, R.K. et al. , J. Appl. Phys. 68. 233 (1990).Google Scholar
[16] Opower, H. and Press, W., Z. Nat. Forsch. 21a, 344 (1966).Google Scholar
[17] Chen, S. L. and Sekiguehi, T., J. Appl. Phys. 36, 2363 (1965).Google Scholar
[18] Segall, S. B. and Koopman, D. W., Phys. Plasmas 16, 1149 (1973).Google Scholar
[19] Saenger, K. L., J. Appl. Phys. 70, 5629 (1991).Google Scholar