Hostname: page-component-76fb5796d-5g6vh Total loading time: 0 Render date: 2024-04-26T02:24:05.845Z Has data issue: false hasContentIssue false

Performances of Sexithiophene Based Thin-Film Transistor Using Self-Assembled Monolayers

Published online by Cambridge University Press:  10 February 2011

J. Collet
Affiliation:
IEMN-CNRS, Dept of Physics (ISEN), BP69, F-59652 cedex, Villeneuve d'Ascq, France, vuillaume@isen.iemn.univ-lillel.fr
O. Tharaud
Affiliation:
IEMN-CNRS, University of Lille, Dept. Hyperfréquences et Semiconducteurs, BP69, F-59652 cedex, Villeneuve d'Ascq, France.
C. Legrand
Affiliation:
IEMN-CNRS, University of Lille, Dept. Hyperfréquences et Semiconducteurs, BP69, F-59652 cedex, Villeneuve d'Ascq, France.
A. Chapoton
Affiliation:
IEMN-CNRS, University of Lille, Dept. Hyperfréquences et Semiconducteurs, BP69, F-59652 cedex, Villeneuve d'Ascq, France.
D. Vuillaume
Affiliation:
IEMN-CNRS, Dept of Physics (ISEN), BP69, F-59652 cedex, Villeneuve d'Ascq, France, vuillaume@isen.iemn.univ-lillel.fr
Get access

Abstract

High performance thin-film transistors (TFT) made of conducting oligomers are obtained when the organic films are well ordered at a molecular level. Highly ordered films are obtained provided that oligomers have a sufficient mobility on the substrate surface during film formation. One possible way to fulfill such a condition is to evaporate oligomers on heated substrates [1,2]. In this work, we suggest that a high surface mobility is obtained by a chemical functionalization of the silicon dioxide surface, and the corresponding improvements of the TFT performances are evidenced. A self-assembled monolayer of octadecyltrichlorosilane (OTS) was deposited on the SiO2 by chemisorption from solution before the evaporation of sexithiophene film. Room temperature current-voltage measurements indicate that the presence of the OTS monolayer improves TFT performances : threshold voltage is decreased, subthreshold slope is decreased, a high current ratio Ion/Ioff is obtained for a reduced gate voltage excursion, the fieldeffect mobility is slightly increased. We have also fabricated and characterized a nanometer scale organic FET (gate length = 50 nm) made of 6T films and only with a self-assembled monolayer as the insulating film between the degenerated silicon substrate (gate) and the conducting channel (no thick SiO2, we call it « oxide-free » organic FET). Performances of this nanometer size organic FETs are the following : subthreshold slope of 0.35V/dec, threshold voltage of −1.3V, effective mobility of 2×10−4 cm2/V.s.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Gamier, F. et al., J. Am. Chem. Soc. 115, 8716 (1993); B. Servet et al., Chem. Mat. 6, 1809 (1994); B. Servet et al., Adv. Mat. 5, 461 (1993).Google Scholar
2. Gundlach, D.J., Lin, Y.Y., Jackson, T.N., Nelson, S.F. and Schlom, D.G., IEEE Electron Dev. Lett. 18, 87 (1997); Y.Y. Lin, D.J. Gundlach, S.F. Nelson and T.N. Jackson, IEEE Trans. Electron Dev. 44, 1325 (1997).Google Scholar
3. Brozska, J.-B., Shahidzadeh, N. and Rondelez, F., Nature 360, 719 (1992); A.N. Parikh, D.L. Allara, I.B. Azouz and F. Rondelez, J. Phys. Chem. 98, 7577 (1994); J.-B. Brzoska, I. Ben Azouz and F. Rondelez, Langmuir 10, 4367 (1994); D.L. Allara, A.N. Parikh and F. Rondelez, Langmuir 11, 2357 (1995).Google Scholar
4. Dodabalapur, A., Torsi, L. and Katz, H.E., Science 268, 270 (1995).Google Scholar
5. Vuillaume, D., in Amorphous and crystalline insulating thin films, edited by Warren, W.L., Devine, R.A.B., Matsumura, M., Cristoloveanu, S., Homma, Y., Kanicki, J. (Mat. Res. Soc., Pittsburgh, 1997),. vol.446, p. 79; P. Fontaine et al., Appl. Phys. Lett. 62, 2256 (1993).Google Scholar
6. Wasserman, S.R., Tao, Y-T. and Whitesides, G.M., Langmuir 5, 1074 (1989).Google Scholar
7. Boulas, C., Davidovits, J.V., Rondelez, F. and Vuillaume, D., Phys. Rev. Lett 76, 4797 (1996).Google Scholar
8. Vuillaume, D., Boulas, C., Collet, J., Davidovits, J.V. and Rondelez, F., Appl. Phys. Lett 69, 1646 (1996).Google Scholar
9. Collet, J. et al., this conference; J. Collet, M. Bonnier, O. Bouloussa, F. Rondelez and D. Vuillaume, Microelectronic Engineering 36, 119 (1997).Google Scholar
10. Franssila, S., Paloheimo, J. and Kuivalainen, P., Electon. Lett. 29, 713 (1993).Google Scholar