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Oxidation Resistance of TiAl Intermetallics Improved by Vacuum Aluminizing

Published online by Cambridge University Press:  22 February 2011

I-Chung Hsu ,
Shyi-Kaan Wu  and
Ray Yang Lin
I-Chung Hsu
Affiliation:
Institute of Materials Science and Engineering, National Taiwan University, Taipei, Taiwan 106, Repulic of China
Shyi-Kaan Wu
Affiliation:
Institute of Materials Science and Engineering, National Taiwan University, Taipei, Taiwan 106, Repulic of China
Ray Yang Lin
Affiliation:
Institute of Materials Science and Engineering, National Taiwan University, Taipei, Taiwan 106, Repulic of China
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Abstract

TiAl binary intermetallics were aluminized in a vacuum system in order to improve their oxidation resistance. From the observations of optical microscopy and EPMA line scan, several different reaction layers were observed to be formed on respective substrates: pure Ti, Ti-32at.%Al, Ti-50at.%Al. From the results of the X-ray diffraction, the primary reaction layers were identified as TiAl3 structure in these three substrates This reacted layer grows with preferred orientation having [002] axis of TiAl3 perpendicular to the substrate surface from XRD experiments. High temperature oxidation tests revealed that vacuum aluminized layer was responsible for remarkable improvement on the oxidation resistance.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 364: Symposium L – High-Temperature Ordered Intermetallic Alloys–VI , 1994 , 1183
Copyright
Copyright © Materials Research Society 1995

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