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Optical Spectroscopic Profiling of Off-Axis Rf Sputtering

Published online by Cambridge University Press:  25 February 2011

J. D. Klein  and
A. Yen
J. D. Klein
Affiliation:
EIC Laboratories, Norwood, MA 02062
A. Yen
Affiliation:
EIC Laboratories, Norwood, MA 02062
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Abstract

The optical emission spectra resulting from if magnetron sputtering a BaTiO3 target were observed to survey substrate position implications. A collimated optical fiber bundle parallel to the plane of the sputter target was translated vertically and horizontally to spectroscopically profile the sputter process. The resulting Ar, O, Ba, and Ti emission intensity contours and the O/Ba and Ba/Ti intensity ratio contours suggest substrate positions that should provide uniform undistorted films. Films deposited on sapphire substrates were found to differ in orientation, lattice parameter, and index of refraction. The optimum offaxis deposition position shifted as the chamber pressure was varied.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 243: Symposium G – Ferroelectric Thin Films II , 1991 , 167
Copyright
Copyright © Materials Research Society 1992

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