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One and Two color Photorefractive Processes in Sputtered WO3 Films

Published online by Cambridge University Press:  10 February 2011

Rebecca Bussjager
Affiliation:
Rome Laboratory, Griffiss AFB, New York 13441–4515
Joseph M. Osman
Affiliation:
Rome Laboratory, Griffiss AFB, New York 13441–4515
J. Chaiken
Affiliation:
Laser Chemical Corporation, 302 Edwards Dr., Fayetteville, New York 13066 and Department of Chemistry, Syracuse University, Syracuse, New York 13244–4100, jchaiken@syr.
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Abstract

As-deposited and derivatized WO3-X films of various stoichiometry were examined in a “nonlinear interface” configuration. The optical properties of the films at 632 nm were modulated using 850 nm and 488 nm CW lasers either separately or simultaneously, Some films were modified by electrochemical reduction. Purely photoinduced changes were interpreted in the context of photoinduced chemistry involving water and/or oxygen exchange with the ambient atmosphere. Both reversible and irreversible changes were observed. Applications as either all-optical switches or logic devices are discussed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

1. Granquist, C. G., “Handbook of Inorganic Electrochromic Materials”(Elsevier, Amsterdam, 1995)Google Scholar
2. Daniel, M. F., Desbat, B., and Lassagues, J. C., J. Solid State Chem. 73, 127139(1988), J. Solid State Chem. 67, 235–247(1987)Google Scholar
3. see for example Sundberg, M. and Tilley, R. J. D., J. Solid State Chem. 11, 150160(1974)Google Scholar
4. see Kaplan, Alexander E., Soviet Physics JETP, 45, 8969045(1977), Appl. Phys. Lett. 38, 67–69 (1981) and references thereinGoogle Scholar
5. Osman, J. M., Martin Villarica, R., Chaiken, J., Proc. SPIE 1626, 217225(1992)Google Scholar
6. for example see Henon, S. and Meunier, J., Rev. Sei. Instrum. 62, 936939(1991)Google Scholar
7. Deb, S. K., Philos. Mag. 27, 801(1973)Google Scholar
8. Bechinger, C., Oefinger, G., Herminghaus, S. and Leiderer, P., J. Appl. Phys. 74, 45274533(1993) and laterGoogle Scholar
9. Crandall, R. S. and Faughnan, B. W., Appl. Phys. Lett. 26, 120(1975)Google Scholar
10. Yoshiike, , et al. U.S. Patent 4,711,815Google Scholar
11. Bussjager, Rebecca, Osman, J. M., Martin Villarica, R., Chaiken, J., Proc. SPIE 3075, 3446(1997)Google Scholar
12. Martin Villarica, R., Chaiken, J., Nash, Fazio, Osman, J. M., Bussjager, Rebecca, Proc. Mat. Res. Soc. 397, 347352(1996)Google Scholar
13. Osman, J. M., Bussjager, Rebecca, Nash, Fazio, Martin Villarica, R., Chaiken, J., Appi Phys A. in pressGoogle Scholar
14. Coté, Matthew J., Radloff, Corey, Osman, J. M., Bussjager, Rebecca, Nash, Fazio, Martin Villarica, R., Chaiken, J., J. Appl Phys. Manuscript in preparationGoogle Scholar