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Observations of Domain Structure at Initial Growth Stage of PbTiO3 Thin Films Grown by Mocvd

Published online by Cambridge University Press:  10 February 2011

H. Fujisawa
Affiliation:
fujisawa@elnics.eng.himeji-tech.ac.jp
M. Shimizu
Affiliation:
Department of Electronics, Faculty of Engineering, Himeji Institute of Technology 2167 Shosha, Himeji, Hyogo 671–2201, Japan.
H. Niu
Affiliation:
Department of Electronics, Faculty of Engineering, Himeji Institute of Technology 2167 Shosha, Himeji, Hyogo 671–2201, Japan.
K. Honda
Affiliation:
Fujitsu Laboratory Limited 10–1 Morinosato-Wakamiya, Atsugi, Kanagawa 243–0197, Japan.
S Ohtani
Affiliation:
Fujitsu Laboratory Limited 10–1 Morinosato-Wakamiya, Atsugi, Kanagawa 243–0197, Japan.
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Abstract

Domain structure and growth mechanism of PbTiO3 thin films were investigated using a transmission electron microscopy(TEM) from the viewpoint of size effects. At initial growth stage of (111)-oriented PbTiO3 films prepared by metalorganic chemical vapor deposition(MOCVD), triangle-shaped islands were grown on Pt(111)/SiO2/Si before becoming a continuous film. Triangular islands grew gradually in a lateral dimension. This means that PbTiO3 films grew two-dimensionally at initial growth stage. In cross-sectional TEM photomicrographs, (101)-twin boundaries (90° domain walls) and inclination of {110} or {101}-plane were observed in PbTiO3 islands. This result indicates that such small PbTiO3 islands have a tetragonal structure and could have spontaneous polarization. The minimum island which had 90° domain walls was 10nm high and 18nm wide.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

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References

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