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A Novel Process for Fabricating Force Sensors for Atomic Force Microscopy

Published online by Cambridge University Press:  15 February 2011

M. M. Farooqui  and
A. G. R. Evans
M. M. Farooqui
Affiliation:
University of Southampton, Department of Electronics and Computer Science, Highfield, Southampton SO9 5NH, U.K.
A. G. R. Evans
Affiliation:
University of Southampton, Department of Electronics and Computer Science, Highfield, Southampton SO9 5NH, U.K.
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Abstract

The new technique of scanned force microscopy which enables imaging surface features with sub nanometre resolution has been made possible by the development of highly sensitive, hysteresis free force sensing cantilevers and the availability extremely sharp probing tips. Such cantilevers with integral tips can be micromachined using IC compatible technology, and several processes have been described in literature for their fabrication. These are based on different etching schemes, and require two or more masking stages. A novel process using a single mask is described here for the fabrication of single crystal silicon cantilevers with integral sensing tips. The cantilever thickness can be tailored to provide a range of force constants and resonant frequencies, and the tip profile can be varied from pyramidal to highly cusped. As only a single mask is used in the fabrication, there are no mask alignment errors and precise location of the tip is thereby achieved. This eliminates any twist in the cantilever during scanning which could give rise to distorted imaging. The complete fabrication process and the mask design is described together with SEM photographs of the first batch of devices, which have been evaluated by retrofitting to a commercial atomic force microscope.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 276: Symposia U/Y – Smart Materials Fabrication and Materials for Micro-Electro-Mechanical Systems , 1992 , 253
Copyright
Copyright © Materials Research Society 1992

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References

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