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Novel Application of Amorphous Silicon in Electrostatic Loudspeakers

Published online by Cambridge University Press:  21 February 2011

R. E. I. Schropp
Affiliation:
Department of Atomic and Interface Physics, Debye Institute, Utrecht University, P.O. Box 80,000, 3508 TA Utrecht, The Netherlands
M. Smits
Affiliation:
Final, Speykstraat 2, 3572 XC Utrecht, The Netherlands
H. Meiling
Affiliation:
Department of Atomic and Interface Physics, Debye Institute, Utrecht University, P.O. Box 80,000, 3508 TA Utrecht, The Netherlands
W.G.J.H.M. van Sark
Affiliation:
Department of Atomic and Interface Physics, Debye Institute, Utrecht University, P.O. Box 80,000, 3508 TA Utrecht, The Netherlands
M. M. Boone
Affiliation:
Faculty of Applied Physics, Section for Seismics and Acoustics, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, The Netherlands
J. Bezemer
Affiliation:
Department of Atomic and Interface Physics, Debye Institute, Utrecht University, P.O. Box 80,000, 3508 TA Utrecht, The Netherlands
W. F. van der Weg
Affiliation:
Department of Atomic and Interface Physics, Debye Institute, Utrecht University, P.O. Box 80,000, 3508 TA Utrecht, The Netherlands
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Abstract

A thin film of amorphous silicon (a-Si:H) has been developed for application as the charge retention layer in electrostatic loudspeakers. The vibrating diaphragm in this type of loudspeakers is usually coated with a thin film in order to assure homogeneous charge distribution across the surface. This thin film should be capable of maintaining a high surface charge density and possess a high lateral resistivity to prevent charge displacement. Furthermore, it should be mechanically stable, capable of accomodating mechanical deformation, and resistant against humidity. Conventionally, a graphite layer is used in these applications. However, the conventional layers are frequently unstable and suffer from charge displacement effects eventually leading to electric breakdown. Further requirements are that the film can be deposited continuously and homogeneously over large areas in excess of 1 m2 and that the deposition technique is compatible with the properties of the thin membrane. We investigated small-area prototypes of electrostatic loudspeakers with a-Si:H thin films deposited on polyimide substrates in the Utrecht deposition system, ASTER. Plasma-deposited amorphous silicon films fabricated under certain conditions are shown to meet all of the above requirements.

Type
Research Article
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

1. Hunt, F.V., Electroacoustics, the Analysis of Transduction and Its Historical Background, (American Institute of Physics, New York, 1982).Google Scholar
2. Schropp, R.E.I., Meiling, H., van Sark, W.G.J.H.M., Stammeijer, J., Bezemer, J., and van der Weg, W.F., presented at the 10th European Photovoltaic Solar Energy Conference, Lisbon, Portugal, April 8–12, 1991.Google Scholar
3. Meiling, H., Schropp, R.E.I., van Sark, W.G.J.H.M., Bezemer, J., and van der Weg, W.F., presented at the 10th European Photovoltaic Solar Energy Conference, Lisbon, Portugal, April 8–12, 1991.Google Scholar
4. Meiling, H., van den Boogaard, M.J., Schropp, R.E.I., Bezemer, J., and van der Weg, W.F., in Amorphous Silicon Technology - 1990, edited by Taylor, P.C., Thompson, M.J., LeComber, P.G., Hamakawa, Y. and Madan, A. (Mater. Res. Soc. Proc. 192, Pittsburgh, PA, 1990) pp. 645651.Google Scholar