Hostname: page-component-848d4c4894-4rdrl Total loading time: 0 Render date: 2024-06-19T05:30:33.549Z Has data issue: false hasContentIssue false
  • English
  • Français

Nanosize Metal Alloy Particle Formation in AG and CU Sequentially Implanted Silica

Published online by Cambridge University Press:  22 February 2011

R. A. Zuhr ,
R. H. Magruder III ,
A. Anderson  and
J. E. Wittig
R. A. Zuhr
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831
R. H. Magruder III
Affiliation:
Dept. of Applied and Engineering Sciences, Vanderbilt University, Nashville, TN 37235
A. Anderson
Affiliation:
Dept. of Applied and Engineering Sciences, Vanderbilt University, Nashville, TN 37235
J. E. Wittig
Affiliation:
Dept. of Applied and Engineering Sciences, Vanderbilt University, Nashville, TN 37235
Get access

Abstract:

A series of high purity silica samples were sequentially implanted with Ag and Cu ions at energies such that the depth distributions for each of the ions overlapped. The samples were characterized by RBS, TEM and optical spectroscopy. The optical response was found to be dependent on the order of sequential implantation, as well as the relative concentration of the implanted elements. The changes in the optical response are attributed to composition changes of the metal colloids that are formed as a result of alloying of the sequentially implanted metal ions, as well as to changes in the size the colloids.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 316: Symposium A – Materials Synthesis and Processing Using Ion Beams , 1993 , 457
Copyright
Copyright © Materials Research Society 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Ricard, D., Roussignol, P. and Flytzanis, C., Opt. Lett. 10, 511 (1985).Google Scholar
2 Haglund, R. F., Yang, L., Magruder, R. H. III, Becker, K., Wittig, J. E. and Zuhr, R. A., Opt. Lett. 18, 373 (1993).Google Scholar
3 Magruder, R. H. III, Haglund, R. F., Yang, L., Wittig, J. E. and Zuhr, R. A. MRS Proceedings, Optical Waveguide Materials, Vol. 244, 369 (1992).Google Scholar
4 Magruder, R. H. III, Yang, L., Haglund, R. F., White, C. W., Yang, Lina, Dorsinville, R. and Alfano, R. R., Applied Physics Lett. 62, 1730 (1993)Google Scholar
5 Biersack, J. and Haggmark, L. G., Nucl. Inst. and Meth 174, 257 (1980).Google Scholar
6 Magruder, R. H. III, Kinser, D. L., Wittig, J. E. and Zuhr, R. A., SPIE Proceedings, vol. 1761, 180 (1992).Google Scholar
7 Hosano, H., Fukishima, H., Abe, Y., Weeks, R. A., and Zuhr, R. A., J. Non-Cryst. Solids 143, 157 (1992).Google Scholar
8 Arnold, G. W. and Mazzoldi, P., Ion Beam Modification of Insulators, Mazzoldi, P. and Arnold, G. W., eds. Elsevier, Amsterdam (1987).Google Scholar
9 Weeks, R. A., Materials Science and Technology Vol. 9, Zarzycki, J., ed. VCH, Weinheim (1991).Google Scholar
10 Mie, G., Ann. Phys. 25, 377 (1908).Google Scholar
11 Bohren, C.F. and Huffman, D. R., Absorption and Scattering of Light by Small Particles, John Wiley and Sons, New York (1983).Google Scholar
12 Kreibig, U. and Genzel, L., Surf. Sci. 156, 678 (1985).Google Scholar
13 Hummel, R. E., Electronic Properties of Materials, 2nd Ed., Springer - Verlag, Berlin (1993).Google Scholar