Hostname: page-component-848d4c4894-jbqgn Total loading time: 0 Render date: 2024-06-19T02:06:27.010Z Has data issue: false hasContentIssue false
  • English
  • Français

Multicolor-Effects of Luminescing, Nanostructured Silicon After Spark-Processing in Pure and Composite Gases

Published online by Cambridge University Press:  15 February 2011

M. H. Ludwig ,
A. Augustin  and
R. E. Hummel
M. H. Ludwig
Affiliation:
University of Florida, Department of Materials Science and Engineering, P.O. Box 116400, Gainesville, FL 32611–6400, USA
A. Augustin
Affiliation:
University of Florida, Department of Materials Science and Engineering, P.O. Box 116400, Gainesville, FL 32611–6400, USA
R. E. Hummel
Affiliation:
University of Florida, Department of Materials Science and Engineering, P.O. Box 116400, Gainesville, FL 32611–6400, USA
Get access

Abstract

Spark-processing has been shown recently to generate a silicon-based substance which intensely photoluminesces in the UV/blue or green spectral range, depending on whether the preparation was performed in flowing or stagnant air, respectively. This study reports about significant differences for the radiative properties of spark-processed silicon after preparations in oxygen, nitrogen, and mixtures of both gases. Whereas there is essentially no photoluminescence (PL) after processing in pure nitrogen, an orange PL band at 1.89 eV occurs after preparation in pure oxygen. The orange PL degrades with time and when exposed to laser light. Furthermore, it switches immediately to a more intense blue emission centered at 2.61 eV when the sample is subjected to lower gas pressures. A similar 2.6 eV PL is observed after heat treatments up to 350°C. If, however, spark-processing of Si is carried out in nitrogen and oxygen is added, a green PL arises, centered at 2.35 eV. Moreover, for a volume ratio of about 1:1 N2/O2 a PL band at 3.22 eV emerges, superimposing the green emission. Both bands are about two orders of magnitude more intense than the orange PL, when prepared under otherwise identical processing conditions.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 452 , 1996 , 153
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.Hummel, R.E. and Chang, S-S., Appl. Phys. 61, 1965 (1992)Google Scholar
2.Rüter, D. and Bauhofer, W., J. Luminescence 57, 19 (1993)Google Scholar
3.Ludwig, M.H., Augustin, A., Hummel, R.E. and Gross, Th., J. Appl. Phys. 80, 5318 (1996)Google Scholar
4.Hummel, R.E., Ludwig, M.H., Hack, J. and Chang, S.-S., Sol. State Commun. 96, 683 (1995)Google Scholar
5.Hummel, R.E., Ludwig, M.H., Chang, S.-S., Fauchet, P.M., Vandyshev, Ju.V., and Tsybeskov, L., Sol. State Commun. 95, 553 (1995)Google Scholar
6.Wolford, D.J., Reimer, J.A. and Scott, B.A., Appl. Phys. Lett. 42, 369 (1983)Google Scholar
7.Brandt, M.S., Fuchs, H.D., Stutzmann, M. and Cardona, M., Sol. State Commun. 81, 307 (1992)Google Scholar
8.Ludwig, M.H. in Handbook of Optical Properties. Vol. II: Optics of Small Particles, Interfaces and Surfaces, CRC Press, Boca Raton, 1996, chapter 5Google Scholar
9.Griscom, D.L.. J. Ceramic Soc. of Jap. 99, 923 (1991)Google Scholar
10.Steigmeier, E.F., Auderset, H., Delley, B. and Morf, R., J. Luminescence 57, 9 (1993)Google Scholar
11.Tohmon, R., Shimogaichi, Y., Mizumo, H., Ohki, Y., Nagasawa, K. and Hama, Y., Phys. Rev. Lett. 62, 1388 (1989)Google Scholar
12.Skuja, L., Sol. State Commun. 84, 613 (1992)Google Scholar
13.Awazu, K. and Kawazoe, H., J. Appl. Phys. 68, 3584 (1990)Google Scholar
14.Tamura, H., Rückschloss, M., Wirschen, T. and Veprek, S., Appl. Phys. Lett. 65, 1537 (1994)Google Scholar
15.Kanemitsu, Y., Uto, H., Matsumoto, Y., Matsumoto, T., Futagi, T. and Mimura, H., Phys. Rev. B 48, 2827 (1993)Google Scholar
16.Ludwig, M.H., Hummel, R.E., Augustin, A., Hack, J. and Menniger, J., Appl. Phys. Lett. 67, 2542 (1995)Google Scholar
17.Liao, L.-S., Bao, X.-M., Zheng, X.-Q., Li, N.S. and Min, N-B., Appl. Phys. Lett. 68, 850 (1996)Google Scholar
18.Ludwig, M.H., Menniger, J. and Hummel, R.L., J. Phys.: Condens. Matter 7, 9081 (1995)Google Scholar