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Morphology of Low Temperature Carbon Films Prepared by VHF CVD: Correlation with Field Emission

Published online by Cambridge University Press:  10 February 2011

A.N. Titkov ,
A.I. Kosarev ,
A.J. Vinogradov ,
Z. Waqar ,
I.V. Makarenko  and
T. Felter
A.N. Titkov
Affiliation:
A.F.Ioffe Physico-Technical Institute, St.-Petersburg, 194021, Russia
A.I. Kosarev
Affiliation:
A.F.Ioffe Physico-Technical Institute, St.-Petersburg, 194021, Russia
A.J. Vinogradov
Affiliation:
A.F.Ioffe Physico-Technical Institute, St.-Petersburg, 194021, Russia
Z. Waqar
Affiliation:
A.F.Ioffe Physico-Technical Institute, St.-Petersburg, 194021, Russia
I.V. Makarenko
Affiliation:
A.F.Ioffe Physico-Technical Institute, St.-Petersburg, 194021, Russia
T. Felter
Affiliation:
Sandia National Laboratory, Livermore, CA 94550, USA
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Abstract

The effect of deposition parameters and substrate on the morphology of carbon films prepared in VHF plasma at low temperature has been studied by Atomic Force Microscopy. Carbon films demonstrating superior emission characteristics were the smoothest, but not all of the smoothest films demonstrated good emission. Significant influence of pre-growth treatment of the substrate surface on the emission characteristics of the films was found.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 509: Symposium C – Materials Issues in Vacuum Microelectronics , 1998 , 149
Copyright
Copyright © Materials Research Society 1998

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