Hostname: page-component-76fb5796d-2lccl Total loading time: 0 Render date: 2024-04-26T02:29:11.630Z Has data issue: false hasContentIssue false
  • English
  • Français

Modelling of Nanoindentation of Compliant Layers on Stiffer Substrates using Finite Element Analysis

Published online by Cambridge University Press:  01 February 2011

Charles A Clifford  and
Martin P Seah
Charles A Clifford
Affiliation:
charles.clifford@npl.co.uk, National Physical Laboratory, Quality of Life Division, Hampton Road, Teddington, Middlesex, TW11 0LW, Teddington, N/A, United Kingdom
Martin P Seah
Affiliation:
martin.seah@npl.co.uk, National Physical Laboratory, Teddington, TW11 0LW, United Kingdom
Get access

Abstract

Nanoindentation using an Atomic Force Microscope (AFM) or a nanoindenter was modelled using Finite Element Analysis (FEA). Force versus indentation depth data were taken for a system consisting of a compliant layer on a stiffer substrate. It was found that the FEA results may be expressed analytically by a simple function that describes the reduced modulus value obtained with Oliver and Pharr's method for any moduli values, thickness of layer or radius of the indenter tip. Initial results obtained by varying the Poisson's ratio of the layer and substrate are also presented.

Keywords

scanning probe microscopy (SPM)coatingthin film
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1025: Symposium B – Nanoscale Phenomena in Functional Materials by Scanning Probe Microscopy , 2007 , 1025-B08-07
Copyright
Copyright © Materials Research Society 2008

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Clifford C, A and Seah M, P 2005 Appl Surf Sci 252 1915.Google Scholar
2. Sader, J 2002 Encyclopedia of Surface and Colloid Science, Ed: A, Hubbard, 846.Google Scholar
3. Clifford C, A and Seah M, P 2005 Nanotechnology 16 1666.Google Scholar
4. Bückle, H 1961 VDI Berichte 41 14.Google Scholar
5. Hertz, H 1881 J. Reine und Angewandte Mathematik 92 156.Google Scholar
6. Clifford C, A and Seah M, P 2006 Nanotechnology 17 5283.Google Scholar
7. Clifford C, A and Seah M, P 2008, to be published.Google Scholar