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Modelling of CW Laser Annealing of Multilayer Structures

Published online by Cambridge University Press:  15 February 2011

I.D. Calder ,
R. Sue  and
Emad-Eldin A.A. Aly
I.D. Calder
Affiliation:
Bell-Northern Research, Ottawa, Canada, K1Y 4H7
R. Sue
Affiliation:
Bell-Northern Research, Ottawa, Canada, K1Y 4H7
Emad-Eldin A.A. Aly
Affiliation:
Bell-Northern Research, Ottawa, Canada, K1Y 4H7
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Abstract

A thermal model is developed for cw laser annealing of multilayer structures. Each layer has arbitrary thickness, thermal conductivity and optical properties. Steady state conditions with no phase transition are assumed. A procedure is presented for obtaining the temperature distribution in any system and explicit integral expressions are developed for the two and three layer cases. Results are calculated for the Si/glass and Si/SiO2 /Si systems.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 4: Symposium A – Laser and Electron-Beam Interactions with Solids , 1981 , 489
Copyright
Copyright © Materials Research Society 1982

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References

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