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Minimization of Di Water Consumption In Wet Clean Rinse Tanks

Published online by Cambridge University Press:  10 February 2011

J. Cook
J. Cook*
Affiliation:
Advanced Custom Technologies, Motorola, Inc., 2200 W. Broadway Road, Mesa, AZ 85202
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Abstract

The use of resistivity‐monitored dump‐rinse tanks in semiconductor wet processing allows the rinse process to be optimized, substantially reducing DI water consumption while minimizing the deleterious effects of water on bare silicon surfaces. Optimization experiments performed on the Metals wet clean hoods at ACT yielded optimum rinse cycles consisting of two or three dump cycles plus an overflow rinse to 10ΜΩ, with a calculated savings of about 40,000 gallons of DI water (about 40%) per year compared to previously accepted standards. Experiments indicate that the time required for rinsing is a competing function of the effectiveness of each dump cycle and the time required to physically perform the chosen number of dump cycles.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 447: Symposium L – Environmental, Safety, and Health Issues in IC Pro…… , 1996 , 15
Copyright
Copyright © Materials Research Society 1997

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