Hostname: page-component-76fb5796d-45l2p Total loading time: 0 Render date: 2024-04-26T03:23:18.267Z Has data issue: false hasContentIssue false

Micro-Structuring of Metal Films by Localized Single-Pulse Laser Irradiation

Published online by Cambridge University Press:  22 August 2011

Chandra Prakash R. Gaddam
Affiliation:
Department of Electrical Engineering and Computer Science, University of Toledo, Toledo, OH 43606, U.S.A.
Joseph P. Moening
Affiliation:
Department of Electrical Engineering, Lake Superior State University, Sault Ste. Marie, MI 49783, U.S.A.
Nanke Jiang
Affiliation:
Department of Electrical Engineering and Computer Science, University of Toledo, Toledo, OH 43606, U.S.A.
Daniel G. Georgiev
Affiliation:
Department of Electrical Engineering and Computer Science, University of Toledo, Toledo, OH 43606, U.S.A.
Get access

Abstract

We present data on micrometer-scale localized single-pulse laser irradiation of Au, Cu, Al, or Ti films on borosilicate glass substrates. These metals represent a range of thermal properties, chemical reactivity levels, and relevance to specific applications. A mask projection technique employing a Q-switched Nd:YAG laser, emitting at its fourth harmonic of 266nm, was used to produce the irradiation spots in this work. The metal films, deposited by RF-sputtering, had thicknesses of several hundred nanometers. Sample irradiation was performed in either vacuum or ambient air, and the resulting microstructures were examined by electron microscopy. The results indicate that irradiation of Cu films can lead to the formation of bumps, sharp cones or protrusions. However, the controllability of these structures on Cu films is limited, compared to those formed on Au or Si. The results, upon irradiation of Ti films, are limited to melting and surface roughening or ablation openings, regardless of the conditions of irradiation, film thickness, substrate or ambient gas. The modifications that occur within Al films are reproducible, but limited in shape and size.

Type
Research Article
Copyright
Copyright © Materials Research Society 2011

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Bulgakova, N.M., Panchenko, A.N., Tel’minov, A.E., Shulepov, M.A., Appl.Phys. A98, 393 (2010).Google Scholar
2. Georgiev, D.G., Baird, R.J., Avrutsky, I., Auner, G., Newaz, G., Appl.Phys.Lett. 84, 4881 (2004).Google Scholar
3. Moening, J.P., Thanawala, S.S., and Georgiev, D.G., Appl.Phys. A95, 635 (2009).Google Scholar
4. Moening, J.P., and Georgiev, D.G., J. Appl. Phys. 107, 014307 (2010).Google Scholar
5. Spindt, C.A., Brodie, I., Humphrey, L., Westerberg, E.R., J. Appl. Phys. 47, 5248 (1976).Google Scholar
6. Dvorson, L., Kymissis, I., Akinwande, A.I., J.Vac.Sci.Technol. B, 21, 486 (2003).Google Scholar
7. Busta, H. H., Micromech, J.. Microeng. 2, 43 (1992).Google Scholar
8. Turner, A.M.P., Dowel, N., Turner, S.W.P., Kam, L., Isaacson, M., Turner, J.N., Craighead, H.G., Shain, W., J. Biomedical Res. 51, 430 (2000).Google Scholar
9. Maher, M.P., Pine, J., Wright, J., Tai, Y.C., J. Neuroscience Methods 87, 45 (1999).Google Scholar
10. Moening, J.P., Georgiev, D.G., and Lawrence, J.G., J. Appl. Phys. 109, 014304 (2011).Google Scholar