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Micro Pattern of TiO2 Thin Film Formation by Direct Synthesis From Aqueous Solution and Transcription of Resist Pattern

Published online by Cambridge University Press:  10 February 2011

Takeshi Yao
Affiliation:
Department of Fundamental Energy Science, Graduate School of Energy Science, Kyoto University, Yoshida, Sakyo-ku, Kyoto-shi, 606-8501, JAPAN, yao@scl.kyoto-u.ac.jp
Yoshiharu Uchimoto
Affiliation:
Department of Fundamental Energy Science, Graduate School of Energy Science, Kyoto University, Yoshida, Sakyo-ku, Kyoto-shi, 606-8501, JAPAN
Hiroki Yabe
Affiliation:
Department of Fundamental Energy Science, Graduate School of Energy Science, Kyoto University, Yoshida, Sakyo-ku, Kyoto-shi, 606-8501, JAPAN
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Abstract

Direct synthesis from aqueous solution (DSAS) is the method for synthesizing ceramic oxides in crystalline state directly from aqueous solution at ordinary temperature and ordinary pressure. DSAS is advantageous because of the applicability to making films with wide areas and/or complicated shapes with no requirement of vacuum or high temperature. Micro patterning of materials having high dielectric constant is important for manufacturing electronic devices such as dynamic random access memory, ferroelectric random access memory and so on. By using DSAS, TiO2 thin film was formed on the glass plate surface where micro pattern had been printed by commercial organic photoresist material. Then the resist material was dissolved off by acetone or ethanol with the TiO2 thin film just on. From SEM observation, it is indicated that micro pattern of TiO2 thin film transcribing the resist pattern with minimum line width of I νm was obtained. This method will be applicable to the construction of highly integrated dielectric devices.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

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References

1 Yao, T., J. Mater. Res., 13, 1091 (1998)Google Scholar
2 Yao, T., Uchimoto, Y., Inobe, M., Satoh, K., and Omi, S., The 1999 Electrochemical Society Joint International Meeting Abstracts No. 1399 (1999)Google Scholar