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Metal Deposition with Incoherent Excimer Radiation

Published online by Cambridge University Press:  21 February 2011

Hilmar Esrom  and
Ulrich Kogelschatz
Hilmar Esrom
Affiliation:
Asea Brown Boveri AG, Corporate Research Heidelberg, D-6900 Heidelberg, FRG
Ulrich Kogelschatz
Affiliation:
Corporate Research Baden, CH-5405 Baden, Switzerland
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Abstract

VUV light-induced decomposition of palladium acetate films was performed by using a new incoherent excimer source. With pure xenon this excimer source emits radiation peaking at a wavelength of 172 nm. We investigated mainly the palladium deposition from spin-on palladium acetate films on aluminum oxide substrates. By using EMP we determined the palladium thickness as a function of UV intensity and exposure time. A remarkable temperature effect of the photolytic deposition process was observed also in a temperature range in which no thermal decomposition is possible. The exposure of spin-on palladium acetate films on ceramic substrates was also accomplished through metal contact masks. Patterned palladium films were reinforced by electroless copper and nickel plating processes [1]. The obtained structures had the same high edge quality as those produced by using excimer lasers [2].

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 158: Symposium B – In-Situ Patterning: Selective Area Deposition and Etching , 1989 , 189
Copyright
Copyright © Materials Research Society 1990

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References

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