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Medium Range Order and 1/f Noise in Hydrogenated Silicon Thin Films

Published online by Cambridge University Press:  01 February 2011

T. J. Belich
Affiliation:
School of Physics and Astronomy, University of Minnesota, Minneapolis, MN 55455
J. Kakalios
Affiliation:
School of Physics and Astronomy, University of Minnesota, Minneapolis, MN 55455
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Abstract

Measurements of the second spectra and correlation coefficients of conductance fluctuations are reported for a series of n-type doped a-Si:H films for which the deposition conditions are systematically varied. The non-Gaussian character of the 1/f noise is found to decrease with decreasing deposition temperature, which is also correlated with an increase in the difference between the conductivity and thermopower activation energies (the Q-function). The decrease in non-Gaussian statistics is interpreted as a decrease in the interactions between inhomogeneous current filaments due to increasing long-range disorder in the material.

Type
Research Article
Copyright
Copyright © Materials Research Society 2002

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References

1. Parman, C. E., Israeloff, N. E. and Kakalios, J., Phys. Rev. Lett. 69, 1097(1992).10.1103/PhysRevLett.69.1097Google Scholar
2. Parman, C. E., Israeloff, N. E. and Kakalios, J., Phys. Rev. B 47, 12578(1993).10.1103/PhysRevB.47.12578Google Scholar
3. Weissman, M. B., Rev. Mod. Phys. 60, 537(1988).10.1103/RevModPhys.60.537Google Scholar
4. Weissman, M. B., Rev. Mod. Phys. 65, 829(1993).10.1103/RevModPhys.65.829Google Scholar
5. Reimer, J. A., Vaughan, R. W. and Knights, J. C., Phys. Rev. Lett. 44, 193(1980). J. Baum, K. K. Gleason, A. Pines, A. N.Garroway and J. A. Reimer, ibid. 56, 1377 (1986).Google Scholar
6. Overhof, H. and Beyer, W., Philos. Mag. B 43, 433(1981).Google Scholar
7. Howard, J. A. and Street, R. A., Phys. Rev. B 44, 7935(1991).Google Scholar
8. Parman, C. E., Israeloff, N. E. and Kakalios, J., Phys. Rev. B 44, 8391(1991). L. M. Lust and J. Kakalios, Phys. Rev. Lett. 75, 2192 (1995).Google Scholar
9. Street, R. A., Kakalios, J., Tsai, C. C. and Hayes, T. M., Phys. Rev. B 35, 1316(1987).10.1103/PhysRevB.35.1316Google Scholar
10. Fan, J. and Kakalios, J., Philos. Mag. B 69, 595(1994).10.1080/01418639408240131Google Scholar
11. Restle, P. J., Weissman, M. B., and Black, R. D., J. of Appl. Phys. 54, 5844(1983). P. J.Restle, R. J.Hamilton, M. B.Weissman, and M. S.Love, Phys. Rev. B 31, 2254 (1985).10.1063/1.331809Google Scholar
12. West, P. W., Quicker, D., Dyalsingh, H. M. and Kakalios, J., Mat. Res. Soc. Proc. (Materials Research Society, Pittsburgh, PA) 467, 215(1997).Google Scholar
13. Dyalsingh, H. M., Khera, G. M. and Kakalios, J., Mat. Res. Soc. Proc. (Materials Research Society, Pittsburgh, PA) 377, 577(1995).Google Scholar
14. Quicker, D. and Kakalios, J., Phys. Rev. B 60, 2449(1999).10.1103/PhysRevB.60.2449Google Scholar
15. Belich, T. J. and Kakalios, J., Mat. Res. Soc. Proc. (Materials Research Society, Pittsburgh, PA) 664, A14.5 (2001).Google Scholar
16. Khera, G. M. and Kakalios, J., Phys. Rev. B 56, 1918(1997).10.1103/PhysRevB.56.1918Google Scholar
17. Israeloff, N. E., Ph.D. thesis, University of Illinois at Urbana-Champaign, 1991.Google Scholar