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Measurements of Residual Stress in the Layers of Thin Film Micro-Gas Sensors

Published online by Cambridge University Press:  17 March 2011

Youngman Kim  and
Sung-Ho Choo
Youngman Kim
Affiliation:
Department of Metallurgical Engineering, Chonnam National University, Kwangju 500-757, Koreakimy@chonnam.ac.kr
Sung-Ho Choo
Affiliation:
Department of Metallurgical Engineering, Chonnam National University, Kwangju 500-757, Korea
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Abstract

The mechanical properties of thin film materials are known to be different from those of bulk materials, which are generally overlooked in practice. The difference in mechanical properties can be misleading in the estimation of residual stress states in micro-gas sensors with multi-layer structures during manufacturing and in service.

In this study the residual stress of each film layer in a micro-gas sensor was measured according to the five difference sets of film stacking structure used for the sensor. The Pt thin film layer was found to have the highest tensile residual stress, which may affect the reliability of the micro-gas sensor. For the Pt layer the changes in residual stress were measured as a function of processing variables and thermal cycling.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 657: Symposia EE – Materials Science of Microelectromechanical Systems (MEMS) Devices III , 2000 , EE5.19
Copyright
Copyright © Materials Research Society 2001

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References

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