Hostname: page-component-77c89778f8-gq7q9 Total loading time: 0 Render date: 2024-07-18T18:58:52.476Z Has data issue: false hasContentIssue false
  • English
  • Français

Measurement of Adhesion at Film -Substrate Interfaces by Constant Depth Scratch Testing

Published online by Cambridge University Press:  22 February 2011

I. Dutta ,
D. P. Lascurain  and
E. D. Secor
I. Dutta
Affiliation:
Department of Mechanical Engineering, Naval Postgraduate School, Monterey, CA 93943
D. P. Lascurain
Affiliation:
Department of Mechanical Engineering, Naval Postgraduate School, Monterey, CA 93943
E. D. Secor
Affiliation:
Department of Mechanical Engineering, Naval Postgraduate School, Monterey, CA 93943
Get access

Abstract

Quantitative tests for interfacial adhesion between films and substrates are of criticalimportance in micro-electronic applications. However, many of the available tests are applicable to a limited array of materials systems, or are experimentally complex. In thispaper, a constant depth scratch test, which has been designed to circumvent the limitations associated with currently available tests, is presented along with theoretical developments for the quantification of interfacial shear strength. Because of a fixed scratchgeometry, the test is amenable to straightforward analytical formulations unlike other versions of scratch tests. It is unique in its experimental simplicity, and allows evaluation of interface strength as function of position on the sample. Sample outputs from the test based on Cr films on glass substrates are presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 338: Symposium – Materials Reliability in Microelectronics IV , 1994 , 507
Copyright
Copyright © Materials Research Society 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Strong, J., Rev. Sci. Instrum., 6 (1935) 97.Google Scholar
2. Williams, R. C. and Backus, R. C., J. Appl. Phys., 20 (1949) 98.Google Scholar
3. Annual Book of ASTM Standards, Standard Test Methods for Adhesion of Metallic Coatings, v. 2.05 (1991) 327.Google Scholar
4. Heavens, O. S., J. Phys. Radium, 11 (1950) 355.Google Scholar
5. Benjamin, P. and Weaver, C., Proc. Roy. Soc., A254 (1960) 163.Google Scholar
6. Kuwahara, K., Hirota, H. and Umemeto, N. in Adhesion Measurements on Thin Films, Thick Films and Bulk Coatings, Mittal, K. L., ed., ASTM STP 640, ASTM, Philadel. (1978) 198.Google Scholar
7. Kuwahara, K., Nakahara, S. and Nakagawa, T., Suppl. to Trans., Jpn.Inst.Met., 9 (1968) 1034.Google Scholar
8. Krongelb, S. in Adhesion Measurements on Thin Films, Thick Films and Bulk Coatings, Mittal, K. L., ed., ASTM STP 640, ASTM, Philadel. (1978) 107.Google Scholar
9. Vossen, J. L., Adhesion Measurements on Thin Films, Thick Films and Bulk Coatings, Mittal, K. L., ed., ASTM STP 640, ASTM, Philadel. (1978), p. 122.Google Scholar
10. Gupta, V., Argon, A. S., Cornie, J. A. and Parks, D. M., Mater. Sci. Eng., A126 (1990) 105.Google Scholar
11. Spies, G. J., J. Aircraft Eng., 25 (1953) 64.Google Scholar
12. Aravas, N., Kim, K. S. and Loukis, M. J., Mater. Sci. Eng., A107 (1989) 159.Google Scholar
13. Marshall, D. B. and Evans, A. G., J. Appl. Phys., 56 (1984) 2632.Google Scholar
14. Rossington, C., Evans, A.G., Marshall, D.B. and Khuri-Yakub, B., J.Appl.Phys.,56(1984) 2639.Google Scholar
15. Engel, P. A., Int. J. Adhesion and Adhesives, 5 (1984) 455.Google Scholar
16. Lin, M.R., Ritter, J. E., Rosenfeld, L. and Lardner, T.J., J. Mater. Research, 5 (1990) 1110.Google Scholar
17. Sachsem, W. Kim, K. Y. and Conway, H. D., Proc. MRS Symp., 154 (1989) 293.Google Scholar
18. Valli, J., Makela, U., Matthews, A. and Murama, V., J. Vacuum Sci. Tech., A3 (1985) 2411.Google Scholar
19. Julia-Schmutz, C. and Hintermann, H. E., Surface and Coatings Tech., 48 (1991) 1.Google Scholar
20. Wu, T. W., J. Mater. Res., 6 (1991) 407.Google Scholar
21. Venkataraman, S.K., Kohlstedt, D.L. and Gerberich, W.W., Thin Solid Films, 223 (1993) 269.Google Scholar
22. Matthewson, M. J., Appl. Phys. Lett., 49 (1986) 1426.Google Scholar
23. Ritter, J. E., Lardner, T. J., Rosenfeld, L. and Lin, M. R., J. Appl. Phys., 66 (1989) 3626.Google Scholar
24. Hedenqvist, P., Olsson, M. and Jacobson, S., Surface and Coatings Tech., 41 (1990) 31.Google Scholar
25. Bull, S. J., Surface and Coatings Tech., 50 (1991) 25.Google Scholar
26. Valli, J. and Makela, U., Wear, 115 (1987) 215.Google Scholar