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Magnetic and Structural Properties of Granular Iron-Silicon Dioxide Thin Films

Published online by Cambridge University Press:  28 February 2011

M.J. Carey ,
F.T. Parker  and
A.E. Berkowitz
M.J. Carey
Affiliation:
University of California, San Diego, Department of Physics (B-019) and Center for Magnetic Recording Research (R-001), La Jolla, CA 92093
F.T. Parker
Affiliation:
University of California, San Diego, Department of Physics (B-019) and Center for Magnetic Recording Research (R-001), La Jolla, CA 92093
A.E. Berkowitz
Affiliation:
University of California, San Diego, Department of Physics (B-019) and Center for Magnetic Recording Research (R-001), La Jolla, CA 92093
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Abstract

Fe-SiO2 granular films were produced by co-sputtering from separate Fe and SiO2 targets. Films deposited on silicon nitride membranes were thin enough to observe directly by transmission electron microscopy (TEM). The coercive force (Hc) was strongly dependent on temperature and volume fraction of Fe as observed in previous investigations, but with lower Hc. Two features of the films with low Fe concentrations were remarkable. The hysteresis loops show high remanence, and the room temperature TEM images show stable domain structure and ripple patterns. This behavior is inconsistent with a model of non-percolating, non-interacting superparamagnetic Fe grains.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 195: Symposium S – Physical Phenomena in Granular Materials , 1990 , 445
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

1. Abeles, B., in Applied Solid State Science: Advances in Materials and Device Research, edited by Wolf, Raymond (Academic Press, New York, 1976), p. 1.Google Scholar
2. Xiao, Gang and Chien, C.L., Appl. Phys. Lett. 51, 1280 (1987).Google Scholar
3. Griedanus, F.J.A.M., Jacobs, B.A.J., Broeder, F.J.A. den, and Spruit, J.H.M, Appl. Phys. Lett. 54, 963 (1989).Google Scholar
4. Bassous, E. and Baron, E.F., J. Elecrochem. Soc. 125, 1321 (1973).Google Scholar
5. Steams, M. B., Phys. Rev. 129, 1136 (1963).Google Scholar