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Laser Pulse Triggering of the Explosive Crystallization in Amorphous Si and Ge Thin Films

Published online by Cambridge University Press:  25 February 2011

W. Marine
Affiliation:
Groupe de Physique des Etats Condensés, U.A. CNRS 783, - Département de Physique, - Faculté des Sciences de Luminy, - Case 901, - 13288 Marseille Cedex 9, - France
J. Marfaing
Affiliation:
Groupe de Physique des Etats Condensés, U.A. CNRS 783, - Département de Physique, - Faculté des Sciences de Luminy, - Case 901, - 13288 Marseille Cedex 9, - France
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Abstract

The structure and morphologies of the thin amorphous a-Si and oc-Ge films crystallized “in situ” in an electronic microscope by pulsed YAG laser have been studied using conventional and high-resolution transmission electronic microscopy observations. It is found that the laser induced nucleation rate (I) is laser pulse length dependent. I is about 1021-1022 cm−3 s−1 (α-Si) and 1023-1025 cm−3 s−1 (α-Ge) near the melting point. Explosive dendritic formation is the result of competition between solid state light induced nucleation and melting mediated explosive growth.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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References

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