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Laser Patterning and Electrical Properties of Submicron Lines of Y-Ba-Cu-O

Published online by Cambridge University Press:  21 February 2011

J. P Zheng
Affiliation:
State University of New York at Buffalo, Institute on Superconductivity, Bonner Hall, Amherst, NY 14260
Q. Y. Ying
Affiliation:
State University of New York at Buffalo, Institute on Superconductivity, Bonner Hall, Amherst, NY 14260
H. S. Kim
Affiliation:
State University of New York at Buffalo, Institute on Superconductivity, Bonner Hall, Amherst, NY 14260
D. Bhattacharya
Affiliation:
State University of New York at Buffalo, Institute on Superconductivity, Bonner Hall, Amherst, NY 14260
D. T. Shaw
Affiliation:
State University of New York at Buffalo, Institute on Superconductivity, Bonner Hall, Amherst, NY 14260
H.S. Kwok
Affiliation:
State University of New York at Buffalo, Institute on Superconductivity, Bonner Hall, Amherst, NY 14260
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Abstract

0.6 µm-wide lines of high Tc Y-Ba-Cu-O have been fabricated by direct laser writing on mirror-like thin films which were grown by laser deposition without post annealing. Laser ablation etching had no effect on the Tc and Jc until the lines were < 1µm wide. The 0.6 µm-wide strip showed some degradation of Tc and Jc. The critical current densities for these patterned lines were measured to be ∼5×106 A/cm2 at 50 K.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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References

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