Hostname: page-component-7479d7b7d-wxhwt Total loading time: 0 Render date: 2024-07-12T13:22:14.469Z Has data issue: false hasContentIssue false
  • English
  • Français

Laser Assisted Deposition of Thin BiSrCaCuO Films

Published online by Cambridge University Press:  16 February 2011

A. Cheenne ,
J. Perriere ,
F. Kerherve ,
G. Hauchecorne ,
E. Fogarassy  and
C. Fuchs
A. Cheenne
Affiliation:
Groupe de Physique des Solides, Université Paris VII, URA 17, Tour 23, 2, Place Jussieu, 75251 Paris Cedex 05, France.
J. Perriere
Affiliation:
Groupe de Physique des Solides, Université Paris VII, URA 17, Tour 23, 2, Place Jussieu, 75251 Paris Cedex 05, France.
F. Kerherve
Affiliation:
Groupe de Physique des Solides, Université Paris VII, URA 17, Tour 23, 2, Place Jussieu, 75251 Paris Cedex 05, France.
G. Hauchecorne
Affiliation:
Groupe de Physique des Solides, Université Paris VII, URA 17, Tour 23, 2, Place Jussieu, 75251 Paris Cedex 05, France.
E. Fogarassy
Affiliation:
Centre de Recherches Nucléaires, Laboratoire PHASE, ER 292, 23, Rue du Loess, 67037 Strasbourg Cedex, France.
C. Fuchs
Affiliation:
Centre de Recherches Nucléaires, Laboratoire PHASE, ER 292, 23, Rue du Loess, 67037 Strasbourg Cedex, France.
Get access

Abstract

A study of the pulsed laser evaporation process of thin superconducting films using both Nd:YAG and ArF eximer lasers is presented. Nuclear reaction analysis, Rutherford backscattering spectrometry (RBS) and scanning electron microscopy were used to characterize composition, thickness and surface morphology of the deposited films. The influence on the properties of the films, of the various parameters of the method such as photon wavelength, laser power density and geometrical conditions are presented and discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 191: Symposium N – Laser Ablation for Materials Synthesis , 1990 , 229
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1- Cheung, J.T., Sankur, H., CRC Critical Review 15, 63 (1988).Google Scholar
2- Dijkamp, D., Venkatesan, T., Wu, X.D., Shaheen, S.S., Jiswari, N., Min-Lee, Y.H., McLean, W.L., Croft, M., Appl. Phys. Lett. 51, 619 (1987).Google Scholar
3- Koren, G., Gupta, A., Baseman, R.J., Lutwyche, M.I., Laibowitz, R.B., Appl. Phys. Lett. 55, 2450 (1989).Google Scholar
4- Doolittle, L.R., Nucl. Instrum. Methods B9, 344 (1985).Google Scholar
5- Perrière, J., Hauchecorne, G., Kerhervé, F., Rochet, F., Defourneau, R.M., Simon, C., Rosenman, I., Enard, J.P., Laurent, A., J. Mat. Res. 5, 258 (1990).Google Scholar
6- Dawson, J., Kaw, P., Green, B., Phys. Fluids 12, 875 (1969).Google Scholar