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Large Area Photochemical Dry Etching of Polymers with Incoherent Excimer UV Radiation

Published online by Cambridge University Press:  25 February 2011

Hilmar Esrom ,
Jun-Ying Zhang  and
Ulrich Kogelschatz
Hilmar Esrom
Affiliation:
Asea Brown Boveri AG, Corporate Research, W-6900 Heidelberg, GERMANY
Jun-Ying Zhang
Affiliation:
Asea Brown Boveri AG, Corporate Research, W-6900 Heidelberg, GERMANY
Ulrich Kogelschatz
Affiliation:
CH-5405 Baden, SWITZERLAND
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Abstract

Photochemical dry etching and surface modification of different polymers, e.g., poly-methylmethacrylate (PMMA), polyimid (PI) and poly-ethylene terephthalate (PET) was achieved with an incoherent excimer UV source. Decomposition and etch rates of PMMA were determined as a function of UV intensity and exposure time at different wavelengths λ = 172 nm (Xe2*), λ = 222 nm (KrCI*) and λ = 308 nm (XeCI*). The morphology of the exposed area of PMMA was investigated with SEM. The etching of the polymers can be explained as a result of extensive photooxidation. The results are compared with data obtained from mercury lamp and excimer laser experiments.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 236: Symposium B – Photons and Low Energy Particles in Surface Processing , 1991 , 39
Copyright
Copyright © Materials Research Society 1992

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