Hostname: page-component-848d4c4894-pjpqr Total loading time: 0 Render date: 2024-07-03T19:08:09.583Z Has data issue: false hasContentIssue false

Kinetic Instability of Semiconductor Alloy Growth

Published online by Cambridge University Press:  10 February 2011

I. P. Ipatova
Affiliation:
A.F. Ioffe Physical Technical Institute, St. Petersburg 194021, Russia
V. G. Malyshkin
Affiliation:
A.F. Ioffe Physical Technical Institute, St. Petersburg 194021, Russia
V. A. Shchukin
Affiliation:
A.F. Ioffe Physical Technical Institute, St. Petersburg 194021, Russia
A. A. Maradudin
Affiliation:
Department of Physics and Astronomy and the Institute for Surface and Interface Science, University of California, Irvine, CA 92697, USA
R. F. Wallis
Affiliation:
Department of Physics and Astronomy and the Institute for Surface and Interface Science, University of California, Irvine, CA 92697, USA
Get access

Abstract

A kinetic theory of the instability of homogeneous alloy growth with respect to fluctuations of alloy composition is developed. The growth mechanism studied is the step-flow growth of an alloy from the vapor on a surface vicinal to the (001) surface of a cubic substrate. The epitaxial growth implies that the adsorbed atoms migrate on the surface during growth of each monolayer, and that their motion is “frozen” after the completion of the monolayer. Frozen fluctuations in all completed monolayers create, via the composition-dependent lattice parameter, an effective potential which influences the surface migration of adatoms. The migration consists of diffusion and strain-induced drift in the effective potential. For temperatures lower than a certain critical temperature Tc, strain-induced drift dominates diffusion and results in the kinetic instability of the homogeneous alloy growth. In the linear approximation in the fluctuation amplitude, the instability means the exponential increase of the fluctuation amplitude with the thickness of the epitaxial film. It is shown that the critical temperature of kinetic instability Tc, increases with the increase of elastic effects. The wave vector kc of the most unstable mode of composition fluctuations is determined by the interplay of anisotropic elastic interaction and anisotropic diffusion on a stepped vicinal surface. The direction of the wave vector kc differs from the lowest-stiffness direction of the crystal, and any direction of kc is possible.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1.]Zunger, A. and Mahajan, S., in: Handbook on Semiconductors, edited by Moss, T.S., V. 3, edited by S. Mahajan, Elsevier, 1994, pp. 13991454.Google Scholar
[2.]Calm, J.W., Trans. Met. Soc. 242, pp. 166180 (1968).Google Scholar
[3.]Khachaturyan, A.G., Theory of structural transformations in solids, Wiley, New York, 1983.Google Scholar
[4.]Ipatova, I.P., Malyshkin, V.G., and Shchukin, V.A., J. Appl. Phys. 74, pp. 71987210 (1993); Phil. Mag. B 57, pp. 557–566 (1994).Google Scholar
[5.]Sharma, B.L., Defect and Diffusion Forum 64/65, pp. 1140 (1989).Google Scholar
[6.]Gyuer, J.E. and Voorhees, P.W., Phys. Rev. Lett. 74, pp. 40314034 (1995); Phys. Rev. B 54, pp. 11710–11724 (1996).Google Scholar
[7.]Portz, K. and Maradudin, A.A., Phys. Rev. B 16, pp. 35353540 (1977).Google Scholar
[8.]Srolovitz, D., Acta Metall. 37, pp. 621625 (1989).Google Scholar
[9.]Aleiner, I.L. and Suris, R.A., Soviet Phys. Solid State 34, pp. 809818 (1992).Google Scholar
[10.]Schwoebel, R.L., J. Appl. Phys. 40, pp. 614618 (1969).Google Scholar
[11.]Ipatova, I.P., Malyshkin, V.G., Maradudin, A.A., Shchukin, V.A., and Wallis, R.F., Phys. Rev. B 57, pp. 1296812993 (1998).Google Scholar
[12.]Jun, S.W., Seong, T.-Y., Lee, J.H., and Lee, B.. Appl. Phys. Lett. 68, pp. 34433445 (1996).Google Scholar