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Ion Beam Deposition of Diamond-Like Coatings*

Published online by Cambridge University Press:  25 February 2011

Anton C. Greenwald
Affiliation:
Spire Corporation, Redford, MA 01730
James K. Hirvonen
Affiliation:
Spire Corporation, Redford, MA 01730
Narendra K. Jaggi
Affiliation:
Northeastern University, Boston, MA 02115
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Abstract

Mass analyzed and non-mass analyzed carbon ion beams were used to deposit coatings on polished silicon wafers. Extremely, hard dense coatings that are structurally similar to i-carbon as determined by Ramon spectroscopy were achieved with high current beams of methane and argon. Residual contaminants of oxygen and nitrogen were minimized.

Type
Research Article
Copyright
Copyright © Materials Research Society 1989

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Footnotes

*

wthis research was funded by the U.S. Army Research Office Innovative Research contract number DAAL03-87-C-0028.

References

REFERENCES

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