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Ion Beam Deposition of Amorphous Carbon Films With Diamond Like Properties

Published online by Cambridge University Press:  15 February 2011

John C. Angus
Affiliation:
Case Western Reserve University, Cleveland, Ohio 44106
Michael J. Mirtich
Affiliation:
NASA Lewis Research Center, 21000 Brookpark Road, Cleveland, Ohio 44135
Edwin G. Wintucky
Affiliation:
NASA Lewis Research Center, 21000 Brookpark Road, Cleveland, Ohio 44135
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Abstract

Carbon films were deposited on silicon, quartz, and potassium bromide substrates from an ion beam. Growth rates were approximately 0.3 μm/hour. The films were featureless and amorphous and contained only carbon and hydrogen in significant amounts. The density and carbon/hydrogen ratio indicate the film is a hydrogen deficient polymer. One possible structure, consistent with the data, is a random network of methylene linkages and tetrahedrally coordinated carbon atoms.

Type
Research Article
Copyright
Copyright © Materials Research Society 1982

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References

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