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Investigation of MgO and Mg1-xTixO thin Films by Electrostatic Spray Deposition Method for a Protective Layer of AC-Plasma Display Panel

Published online by Cambridge University Press:  17 March 2011

Soo Gil Kim
Affiliation:
School of Material Science & Engineering, Seoul National Univ., Seoul, 151-742, Korea
Young-Kee Kim
Affiliation:
Department of Electrical Engineering, Pusan National Univ., Pusan, 609-735, Korea
Chung-Hoo Park
Affiliation:
Department of Electrical Engineering, Pusan National Univ., Pusan, 609-735, Korea
Hyeong Joon Kim
Affiliation:
School of Material Science & Engineering, Seoul National Univ., Seoul, 151-742, Korea
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Abstract

MgO and Mg1-xTixO thin films were deposited by the electrostatic spray deposition method using Mg(tmhd)2 and Ti(OiPr)2(tmhd)2 as source materials and tetrahydrofuran and 1-octyl alcohol as solvents. The refractive index of the films shows a strong change from 1.73 for MgO to 2.39 for TiO2. The optical band gap energy values are 3.83 eV for TiO2 film and higher than 5.1 eV for films of Mg/(Mg+Ti) > 0.67. The discharge voltage and current increased with a content of Ti in Mg1-xTixO films. All these changes are closely associated with different Mg/(Mg+Ti) ratios of the films.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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