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Interfacial Characterization of Mosi2+ X Sic Composite Thin Films on Molybdenum Substrates

Published online by Cambridge University Press:  10 February 2011

S. Govindarajan ,
J. J. Moore ,
T. R. Ohno  and
J. Disam
S. Govindarajan
Affiliation:
Department of Metallurgical & Materials Engineering, Colorado School of Mines, Golden, CO-80401
J. J. Moore
Affiliation:
Department of Metallurgical & Materials Engineering, Colorado School of Mines, Golden, CO-80401
T. R. Ohno
Affiliation:
Department of Physics, Colorado School of Mines, Golden, CO - 80401
J. Disam
Affiliation:
Schott Glaswerke, Mainz, Germany.
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Abstract

A novel coating architecture is being examined for enhancing the high temperature, oxidation resistance of molybdenum. The coating incorporates a thin, composite film of MoSi2+1.96 mole fraction SiC in order to match the coefficients of thermal expansion between the molybdenum substrate and the coating. Since the as-deposited composite film is amorphous in nature, a diffusion anneal treatment is carried out at 1000°C to achieve crystallization of the film. In this paper, a detailed examination of the Mo-MoSi2+1.96 SiC interface will be presented. The microstructural features of the composite films will be discussed based on electron microscopy, auger electron spectroscopy (AES), and X-ray diffraction analysis. Finally, a novel diffusion barrier layer for minimizing silicon and carbon diffusion from the coating to the substrate will be discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 458: Symposium W – Interfacial Engineering for Optimized Properties , 1996 , 489
Copyright
Copyright © Materials Research Society 1997

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References

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