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Interface Effects on the Adhesion of Thin Aluminum Films

Published online by Cambridge University Press:  10 February 2011

J.A. Schneider ,
S. Guthrie  and
N.R. Moody
J.A. Schneider
Affiliation:
Sandia National Laboratories, Livermore, CA 94551–0969
S. Guthrie
Affiliation:
Sandia National Laboratories, Livermore, CA 94551–0969
N.R. Moody
Affiliation:
Sandia National Laboratories, Livermore, CA 94551–0969
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Abstract

Differences in the adhesion and fracture toughness of aluminum films on sapphire due to the presence of controlled contaminants are being investigated. Adhesion is evaluated by use of nanoindentation and continuous scratch tests. A comparison was made of the properties of textured thin films of aluminum (178 to 1890 nm) that were vapor deposited onto (0001) oriented sapphire substrates. A very thin (1 nm) layer of carbon was deposited at the interface of selected samples prior to the vapor deposition of the aluminum. Spalling was observed during continuous scratch testing in specimens with carbon at the interface but not in specimens without carbon at the interface.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 472: Symposium I – Polycrystalline Thin Films - Structure, Texture, Properties..III , 1997 , 155
Copyright
Copyright © Materials Research Society 1997

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References

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