Hostname: page-component-76fb5796d-9pm4c Total loading time: 0 Render date: 2024-04-26T14:34:36.801Z Has data issue: false hasContentIssue false

Interdiffusion and Reaction of Pd on Atomically Stepped 6H-SiC Surfaces: Progress Toward Thermally Stable High Temperature Gas Sensors

Published online by Cambridge University Press:  01 February 2011

C. D. Stinespring
Affiliation:
Department of Chemical Engineering, West Virginia University, Morgantown, WV 26506–6102
C. Y. Peng
Affiliation:
Department of Chemical Engineering, West Virginia University, Morgantown, WV 26506–6102
A. A. Woodworth
Affiliation:
Department of Physics, West Virginia University, Morgantown, WV 26506–6315
K. Meehan
Affiliation:
Bradley Department of Electrical and Computer Engineering, Virginia Polytechnic Institute and State University, Blacksburg, VA 24060
M. J. Murdoch-Kitt
Affiliation:
Bradley Department of Electrical and Computer Engineering, Virginia Polytechnic Institute and State University, Blacksburg, VA 24060
C. L. Anderson
Affiliation:
Bradley Department of Electrical and Computer Engineering, Virginia Polytechnic Institute and State University, Blacksburg, VA 24060
Get access

Abstract

High temperature Pd-SiC Schottky diode gas sensors are known to thermally degrade due to interdiffusion and reaction at the metal-semiconductor interface. To understand and possibly eliminate this problem, detailed surface studies of thermally induced Pd-SiC surface interactions have been performed. These experiments compare standard 6H-SiC (0001) surfaces typical of those used in device fabrication with periodically stepped surfaces prepared by high temperature hydrogen etching. The Pd films range in thickness from the monolayer level (∼0.4 nm) to actual device dimensions (∼46.5 nm) and are deposited under ultrahigh vacuum conditions at ∼50 °C. These films are characterized in-situ using Auger electron spectroscopy both before and after annealing at 670 °C. The Auger lineshapes provide quantitative information on the chemistry of the reaction products. Ex-situ atomic force microscopy is used to characterize changes in surface morphology.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Neudeck, P.G., Okojie, R.S., and Chen, L-Y., Proc. IEEE 90, 1065 (2002).Google Scholar
2. Unéus, L., Ljung, P., Mattsson, M., Mårtenssson, P., Wigren, R., Tobias, P., Lundström, I., Ekedahl, L-G., and Lloyd Spetz, A., Measurements with MISiC and MOS Sensors in Flue Gases, Proc. of Eurosensors XIII, The Hague, September 12–15, 521524 (1999).Google Scholar
3. Chen, L-Y., Hunter, G.W., Neudeck, P.G., Bansal, G., Petit, J.B., and Knight, D., J. Vac. Sci. Technol. A15, 1228 (1997).Google Scholar
4. Ramachandran, V., Brady, M.F., Smith, A.R., Feenstra, R.M., Greve, D.W., J. Electronic Materials 27 308 (1998).Google Scholar
5. Woodworth, A.A., Peng, C.Y., Stinespring, C.D., and Meehan, K., (2004) (to be published).Google Scholar
6. Kittel, C., Introduction to Solid State Physics, 7th Ed., John Wiley & Sons, Inc. (1996).Google Scholar
7. Davis, L.E., MacDonald, N.C., Palmberg, P.W., Riach, G.E., and Weber, R.E., Handbook of Auger Electron Spectroscopy, 2nd Ed., Physical Electronics, Eden Prairie Minnesota (1978).Google Scholar
8. Bermudez, V.M., Appl. Surf. Sci. 17, 12 (1983).Google Scholar
9. Lannon, J.M., Gold, J.S., and Stinespring, C.D., Appl. Phys. Lett. 73, 226 (1998).Google Scholar