Hostname: page-component-8448b6f56d-wq2xx Total loading time: 0 Render date: 2024-04-24T22:05:08.782Z Has data issue: false hasContentIssue false

Influence Of Substrate Temperature On Barium Ferrite Films Prepared by Laser Deposition

Published online by Cambridge University Press:  10 February 2011

W.D. Song
Affiliation:
Laser Microprocessing Laboratory, Department of Electrical Engineering and Data Storage Institute, 10 Kent Ridge Crescent, Singapore, 119260
Y.F. Lu
Affiliation:
Laser Microprocessing Laboratory, Department of Electrical Engineering and Data Storage Institute, 10 Kent Ridge Crescent, Singapore, 119260
W.J. Wang
Affiliation:
Laser Microprocessing Laboratory, Department of Electrical Engineering and Data Storage Institute, 10 Kent Ridge Crescent, Singapore, 119260
T.C. Chong
Affiliation:
Laser Microprocessing Laboratory, Department of Electrical Engineering and Data Storage Institute, 10 Kent Ridge Crescent, Singapore, 119260
Get access

Abstract

Influence of substrate temperature on properties of barium ferrite films prepared by laser deposition is studied in this paper. The magnetic properties, grain shape and crystalline orientation of the films are discussed for the films prepared by laser deposition with in-situ heating, post annealing and varying substrate temperature. The results show that magnetic properties, grain shape and crystalline orientation of the film deposited with varying substrate temperature are close to the film deposited with post-annealing and different to the film deposited with in-situ heating.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 , Okamoto, Kaitsu, I., Akimoto, H., Sato, K., Abarra, E.N. and Shinohara, M., IEEE Trans. Magn., 35, 2655(1999).Google Scholar
2 McCurrie, R.A., Ferromagnetic Materials, Academic Press, London, pp 1-23, pp235243, 1994.Google Scholar
3 Hylton, T.L., Parker, M.A., Ullah, M., Coffey, K.R., Umphress, R. and Howard, J.K., J. Appl. Phys. 75(10), 5960(1994).Google Scholar
4 Sin, K., Sivertsen, J.M., Judy, J.H., J. Appl. Phys. 75(10), 5972(1994).Google Scholar
5 Sui, X. Y., Kryder, M.H., Wong, B.Y. and Laughlin, D.E., IEEE Trans. Magn., 29(6), 3751(1993).Google Scholar
6 Hylton, T.L., Parker, M.A. and Howard, J.K., Appl. Phys. Lett., 61(7), 867(1992).Google Scholar
7 Hoshi, Y., Kubota, Y. and Naoe, M., IEEE Trans. Magn., 31(6), 2782(1995).Google Scholar
8 Morisako, A., Matsumoto, M. and Naoe, M., J. Magn. Magn. Mater., 193, 110(1999).Google Scholar
9 Lu, Y.F., Song, W.D., Appl. Phys. Lett., 76(4), 490(2000).Google Scholar
10 Carosella, C.A., Chrisey, D.B., Lubitz, P., Horwitz, J.S., Dorsey, P., Seed, R. and Vittoria, C., J. Appl. Phys. 71(10), 5107(1992).Google Scholar
11 Masterson, H.J., Lunney, J.G., Coey, J.M.D., Atkinson, R., Salter, I.W. and Papakonstantinou, P., J. Appl. Phys. 73(8), 3917(1993).Google Scholar
12 Welch, R.G., Jackson, T.J. and Palmer, S.B., IEEE Trans. Magn., 31, 2752(1995).Google Scholar
13 Lisfi, A., Lodder, J.C., Haan, P.de, Smithers, M.A. and Roesthuis, F.J.G., IEEE Trans. Magn., 34, 1654(1998).Google Scholar
14 Song, W.D., Lu, Y.F., Wang, W.J., Ong, C.K., Wang, J.P. and Chong, T.C., IEEE. Trans. Magn. 35(5), 3013(1999).Google Scholar
15 Pignard, S., Vincent, H., Senateur, J.P. and Lucazeau, G., Appl. Phys. Lett., 73(9), 1194(1998).Google Scholar