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Influence of growth conditions on the physical properties of Mn doped ZnO thin films grown by reactive magnetron sputtering

Published online by Cambridge University Press:  10 July 2015

Adrian Camacho-Berrios ,
Victor Pantojas  and
Wilfredo Otaño
Adrian Camacho-Berrios
Affiliation:
University of Puerto Rico, Rio Piedras, San Juan, PR
Victor Pantojas
Affiliation:
University of Puerto Rico, Cayey, PR
Wilfredo Otaño
Affiliation:
University of Puerto Rico, Cayey, PR Institute for Functional Nanomaterials, University of Puerto Rico, San Juan, PR
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Abstract

ZnO thin films were deposited using the DC pulsed magnetron sputtering technique to study how composition and structure influences their magnetic properties. Low sputtering powers and high substrate temperatures were used to increase adatom mobility during deposition, resulting in increased crystallite size and reduced residual stress in the films. Another set of ZnO films were Mn-doped using a second magnetron gun and the amount of doping was changed by controlling the RF sputtering power. For these films, the crystallite size increased with the amount of Mn. The magnetic properties of these materials were counterintuitive; not intentionally doped ZnO showed the highest magnetization and magnetization decreased with increasing Mn concentration.

Keywords

thin filmsputteringferromagnetic
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1805: Symposium SS/TT – Fabrication and Properties of Oxide Thin Films, Nanostructures and Interfaces for Advanced Applications , 2015 , mrss15-2133721
Copyright
Copyright © Materials Research Society 2015 

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