Hostname: page-component-848d4c4894-xfwgj Total loading time: 0 Render date: 2024-06-27T14:29:04.099Z Has data issue: false hasContentIssue false
  • English
  • Français

In Situ Analysis of magnetic and Structural Properties of Epitaxial and Polycrystalline Ni80Fe20 Thin Films

Published online by Cambridge University Press:  03 September 2012

I. Hashim ,
H.A. Atwater  and
Thomas J. Watson
I. Hashim
Affiliation:
Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA 91125
H.A. Atwater
Affiliation:
Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA 91125
Thomas J. Watson
Affiliation:
Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA 91125
Get access

Abstract

We have investigated structural and magnetic properties of epitaxial Ni80Fe20 films grown on relaxed epitaxial Cu/Si (001) films. The crystallographic texture of these films was analyzed in situ by reflection high energy electron diffraction (RHEED), and ex situ by x-ray diffraction and cross-sectional transmission electron Microscopy (XTEM). In particular, RHEED intensities were recorded during epitaxial growth, and intensity profiles across Bragg rods were used to calculate the surface lattice constant, and hence, find the critical epitaxial thickness for which Ni80Fe20 grows pseudomorphically on Cu (100). XTEM analysis indicated that the epitaxial films had atomically-abrupt interfaces which was not the case for polycrystalline Cu and Ni80Fe20 film interfaces. The Magnetic properties of these epitaxial films were Measured in situ using Magneto-optic Kerr effect magnetometry and were compared with those of polycrystalline films grown on SiO2/Si. Large Hc (∼ 35 Oe) was observed for epitaxial Ni80Fe20 films less than 3.0 nm thick whereas for increasing thickness, Hc decreased approximately monotonically to a few Oersteds. Correlations were made between magnetic properties of these epitaxial films, the strain in the film and the interface roughness obtained from XTEM analysis.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 313: Symposium Q1 – Magnetic Ultrathin Films, Multilayers and Surfaces/Magnetic Interfaces-Physics and Characterizations , 1993 , 363
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Parkin, S.S.P., Appl. Phys. Lett. 60, 512 (1992).Google Scholar
[2] Dieny, B., Speriosu, V.S., Gurney, B.A., Parkin, S.S.P., Wilhoit, D.R., Roche, K.P., Metin, S., Peterson, D.T., and Nadimi, S., J. of Magn. and Magn. Mater. 93, 101 (1991).Google Scholar
[3] Mayadas, A.F. and Shatzkes, M., Phys. Rev. B 1, 1382 (1970).Google Scholar
[4] Chang, C.A., Appl. Phys. Lett. 55, 2754 (1989).Google Scholar
[5] Li, J. and Shacham-Diamand, Y., J. Electrochem. Soc. 139, L37 (1992).Google Scholar
[6] Hashim, I., Park, B. and Atwater, H.A., Mater. Res. Soc. Proc. Vol. 280, (1992).Google Scholar
[7] Schaefer, J.A., Physica B 170, 45 (1991).Google Scholar
[8] Takahashi, M., J. Appl. Phys. 33, 1101 (1962).Google Scholar
[9] Freiser, M.J., IEEE Trans. Mag. Mag–4, 152 (1968).Google Scholar
[10] Matthews, J.W. and Blakeslee, A.E., J. Cryst. Growth. 27, 118 (1974).Google Scholar
[11] Hashim, I. and Atwater, H.A., (unpublished).Google Scholar
[12] Klokholm, E. and Aboaf, J.A., J. Appl. Phys. 52, 2474 (1981).Google Scholar